Issued Patents All Time
Showing 51–75 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8093512 | Package of environmentally sensitive electronic device and fabricating method thereof | Jia-Chong Ho, Jing-Yi Yan, Shu-Tang Yeh | 2012-01-10 |
| 7838200 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Wu-Song Huang, Wai-Kin Li, Pushkara R. Varanasi, Sen Liu | 2010-11-23 |
| 7838198 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Wu-Song Huang, Wai-Kin Li, Pushkara R. Varanasi | 2010-11-23 |
| 7803521 | Photoresist compositions and process for multiple exposures with multiple layer photoresist systems | Wu-Song Huang, Wai-Kin Li, Pushkara R. Varanasi | 2010-09-28 |
| 7563563 | Wet developable bottom antireflective coating composition and method for use thereof | Mahmoud Khojasteh, Ranee W. Kwong, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more | 2009-07-21 |
| 7560222 | Si-containing polymers for nano-pattern device fabrication | Wu-Song Huang, Wai-Kin Li, Yi-Hsiung Lin | 2009-07-14 |
| 7407736 | Methods of improving single layer resist patterning scheme | Wu-Song Huang, Chung-Hsi Wu | 2008-08-05 |
| 7217496 | Fluorinated photoresist materials with improved etch resistant properties | Mahmoud Khojasteh, Pushkara R. Varanasi, Wenjie Li, Kaushal S. Patel | 2007-05-15 |
| 7183036 | Low activation energy positive resist | Mahmoud Khojasteh, Pushkara R. Varanasi | 2007-02-27 |
| 7129016 | Positive resist containing naphthol functionality | Mahmoud Khojasteh, Pushkara R. Varanasi | 2006-10-31 |
| 7087356 | 193nm resist with improved post-exposure properties | Mahmoud Khojasteh, Pushkara R. Varanasi, Yukio Nishimura, Eiichi Kobayashi | 2006-08-08 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Mahmoud Khojasteh, Ranee W. Kwong, Pushkara R. Varanasi, Robert David Allen, Phillip Brock +2 more | 2004-08-03 |
| 6696216 | Thiophene-containing photo acid generators for photolithography | Wenjie Li, Pushkara R. Varanasi | 2004-02-24 |
| 6685853 | Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Wayne M. Moreau, David E. Seeger | 2004-02-03 |
| 6515312 | Method for packaging organic electroluminescent device | Hsueh-Wen Chen, Chin-Pei Huang | 2003-02-04 |
| 6420101 | Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure | Zhijian Lu, Alan C. Thomas, Alois Gutmann, Margaret C. Lawson | 2002-07-16 |
| 6372408 | Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles | Zhijian Lu, Alan C. Thomas, Alois Gutmann, Margaret C. Lawson | 2002-04-16 |
| 6365321 | Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations | Ronald A. DellaGuardia, Hiroshi Ito, George M. Jordhamo, Ahmad D. Katnani | 2002-04-02 |
| 6338934 | Hybrid resist based on photo acid/photo base blending | Mark C. Hakey, Steven J. Holmes, Wu-Song Huang, Paul A. Rabidoux | 2002-01-15 |
| 6303263 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh, Qinghuang Lin | 2001-10-16 |
| 6268436 | Approach to formulating irradiation sensitive positive resists | Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh, Quighuang Lin | 2001-07-31 |
| 6203965 | Photoresist comprising blends of photoacid generators | James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray, Wu-Song Huang +3 more | 2001-03-20 |
| 6200726 | Optimization of space width for hybrid photoresist | Steven J. Holmes, Wu-Song Huang, Ahmad D. Katnani, Paul A. Rabidoux | 2001-03-13 |
| 6132644 | Energy sensitive electrically conductive admixtures | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Wayne M. Moreau, David E. Seeger | 2000-10-17 |
| 6103447 | Approach to formulating irradiation sensitive positive resists | Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh, Qinghuang Lin | 2000-08-15 |