Issued Patents All Time
Showing 26–50 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8999624 | Developable bottom antireflective coating composition and pattern forming method using thereof | Steven J. Holmes, Wu-Song Huang, Ranee W. Kwong, Sen Liu | 2015-04-07 |
| 8986918 | Hybrid photoresist composition and pattern forming method using thereof | Gregory Breyta, Steven J. Holmes, Wu-Song Huang, Sen Liu | 2015-03-24 |
| 8932796 | Hybrid photoresist composition and pattern forming method using thereof | Wu-Song Huang, Sen Liu, Steven J. Holmes, Gregory Breyta | 2015-01-13 |
| 8878226 | Light emitting device | Jing-Yi Yan, Shu-Tang Yeh, Chih-Chieh Hsu, Chen-Wei Lin | 2014-11-04 |
| 8871596 | Method of multiple patterning to form semiconductor devices | Kangguo Cheng, Bruce B. Doris, Steven J. Holmes, Sen Liu | 2014-10-28 |
| 8846295 | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof | Wu-Song Huang, Wai-Kin Li | 2014-09-30 |
| 8846296 | Photoresist compositions | Wu-Song Huang, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2014-09-30 |
| 8830202 | Touch-sensing display apparatus and fabricating method thereof | — | 2014-09-09 |
| 8802347 | Silicon containing coating compositions and methods of use | Robert David Allen, Phillip Brock, Alexander Friz, Wu-Song Huang, Ratnam Sooriyakumaran +2 more | 2014-08-12 |
| 8723413 | Touch-sensing display apparatus and fabricating method thereof | — | 2014-05-13 |
| 8715907 | Developable bottom antireflective coating compositions for negative resists | Steven J. Holmes, Wu-Song Huang, Sen Liu | 2014-05-06 |
| 8624134 | Package of environmental sensitive element and encapsulation method of the same | — | 2014-01-07 |
| 8609327 | Forming sub-lithographic patterns using double exposure | Wu-Song Huang, Wai-Kin Li | 2013-12-17 |
| 8568960 | Multiple exposure photolithography methods | Wu-Song Huang, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2013-10-29 |
| 8557637 | Method for fabricating the flexible electronic device | Isaac Wing-Tak Chan | 2013-10-15 |
| 8536031 | Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme | John C. Arnold, Matthew E. Colburn, Dario L. Goldfarb, Stefan Harrer, Steven J. Holmes +1 more | 2013-09-17 |
| 8446730 | Package of environmental sensitive element | Shu-Tang Yeh, Jia-Chong Ho | 2013-05-21 |
| 8394573 | Photoresist compositions and methods for shrinking a photoresist critical dimension | Wu-Song Huang, Wai-Kin Li, Sen Liu | 2013-03-12 |
| 8268542 | Method for reducing side lobe printing using a barrier layer | Wu-Song Huang, Wai-Kin Li | 2012-09-18 |
| 8236126 | Encapsulation method of environmentally sensitive electronic element | Shu-Tang Yeh, Ping-I Shih, Kung-Yu Cheng, Jian-Lin Wu | 2012-08-07 |
| 8236476 | Multiple exposure photolithography methods and photoresist compositions | Wu-Song Huang, Ranee W. Kwong, Sen Liu, Pushkara R. Varanasi | 2012-08-07 |
| 8227180 | Photolithography focus improvement by reduction of autofocus radiation transmission into substrate | Timothy A. Brunner, Sean D. Burns, Wu-Song Huang, Kafai Lai, Wai-Kin Li +1 more | 2012-07-24 |
| 8227307 | Method for removing threshold voltage adjusting layer with external acid diffusion process | Ricardo A. Donaton, Wu-Song Huang, Wai-Kin Li | 2012-07-24 |
| 8202678 | Wet developable bottom antireflective coating composition and method for use thereof | Mahmoud Khojasteh, Ranee W. Kwong, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more | 2012-06-19 |
| 8163466 | Method for selectively adjusting local resist pattern dimension with chemical treatment | Wai-Kin Li | 2012-04-24 |