Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5686796 | Ion implantation helicon plasma source with magnetic dipoles | Roderick Boswell, Albert R. Ellingboe | 1997-11-11 |
| 5650032 | Apparatus for producing an inductive plasma for plasma processes | Michael Barnes, John C. Forster, John E. Heidenreich, III | 1997-07-22 |
| 5612851 | Guard ring electrostatic chuck | Michael Barnes, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1997-03-18 |
| 5587045 | Gettering of particles from an electro-negative plasma with insulating chuck | Gregory Costrini | 1996-12-24 |
| 5561585 | Electrostatic chuck with reference electrode | Michael Barnes, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1996-10-01 |
| 5543184 | Method of reducing particulates in a plasma tool through steady state flows | Michael Barnes, Dennis K. Coultas, John C. Forster, Thomas E. Wicker | 1996-08-06 |
| 5535507 | Method of making electrostatic chuck with oxide insulator | Michael Barnes, Joseph S. Logan, Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1996-07-16 |
| 5518547 | Method and apparatus for reducing particulates in a plasma tool through steady state flows | Michael Barnes, Dennis K. Coultas, John C. Forster, Thomas E. Wicker | 1996-05-21 |
| 5505816 | Etching of silicon dioxide selectively to silicon nitride and polysilicon | Michael Barnes, William M. Holber, Tina J. Cotler, Jonathan D. Chapple-Sokol, Dragan Podlesnik | 1996-04-09 |
| 5467249 | Electrostatic chuck with reference electrode | Michael Barnes, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1995-11-14 |
| 5463525 | Guard ring electrostatic chuck | Michael Barnes, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1995-10-31 |
| 5433258 | Gettering of particles during plasma processing | Michael Barnes, Dennis K. Coultas, John C. Forster, James A. O'Neill | 1995-07-18 |
| 5332441 | Apparatus for gettering of particles during plasma processing | Michael Barnes, Dennis K. Coultas, John C. Forster, James A. O'Neill | 1994-07-26 |
| 5304279 | Radio frequency induction/multipole plasma processing tool | Dennis K. Coultas | 1994-04-19 |
| 5284549 | Selective fluorocarbon-based RIE process utilizing a nitrogen additive | Michael Barnes, Melanie M. Chow, John C. Forster, Michael Fury, Chang-Ching Kin +2 more | 1994-02-08 |
| 5241245 | Optimized helical resonator for plasma processing | Michael Barnes, Dennis K. Coultas, JOHN FORSTER | 1993-08-31 |
| 5207437 | Ceramic electrostatic wafer chuck | Michael Barnes, Dennis K. Coultas, John C. Forster | 1993-05-04 |
| 5206516 | Low energy, steered ion beam deposition system having high current at low pressure | Dennis K. Coultas | 1993-04-27 |
| 5196706 | Extractor and deceleration lens for ion beam deposition apparatus | James W. Robinson | 1993-03-23 |
| 5189446 | Plasma wafer processing tool having closed electron cyclotron resonance | Michael Barnes, John C. Forster | 1993-02-23 |
| 5178739 | Apparatus for depositing material into high aspect ratio holes | Michael Barnes, John C. Forster | 1993-01-12 |
| 4846920 | Plasma amplified photoelectron process endpoint detection apparatus | Gary S. Selwyn, Jyothi Singh | 1989-07-11 |
| 4600464 | Plasma etching reactor with reduced plasma potential | Brian H. Desilets, Thomas Günther, Charles J. Hendricks | 1986-07-15 |
| 4556823 | Multi-function charged particle apparatus | James R. Winnard | 1985-12-03 |
| 4383177 | Multipole implantation-isotope separation ion beam source | Charles M. McKenna | 1983-05-10 |