IP

Igor Peidous

GC Globalwafers Co.: 28 patents #1 of 221Top 1%
CM Chartered Semiconductor Manufacturing: 17 patents #37 of 840Top 5%
AM AMD: 14 patents #820 of 9,279Top 9%
Applied Materials: 4 patents #2,506 of 7,310Top 35%
Globalfoundries: 3 patents #1,029 of 4,424Top 25%
S( Sunedison Semiconductor Limited (Uen201334164H): 2 patents #13 of 46Top 30%
IBM: 1 patents #44,794 of 70,183Top 65%
Lam Research: 1 patents #1,364 of 2,128Top 65%
📍 Kyles, OH: #5 of 94 inventorsTop 6%
🗺 Ohio: #360 of 73,341 inventorsTop 1%
Overall (All Time): #28,389 of 4,157,543Top 1%
71
Patents All Time

Issued Patents All Time

Showing 26–50 of 71 patents

Patent #TitleCo-InventorsDate
10381260 Method of manufacturing high resistivity semiconductor-on-insulator wafers with charge trapping layers Jeffrey L. Libbert, Srikanth Kommu, Andrew M. Jones, Samuel Christopher Pratt, Horacio Josue Mendez +2 more 2019-08-13
10381261 Method of manufacturing high resistivity semiconductor-on-insulator wafers with charge trapping layers Jeffrey L. Libbert, Srikanth Kommu, Andrew M. Jones, Samuel Christopher Pratt, Horacio Josue Mendez +2 more 2019-08-13
10283402 Method of depositing charge trapping polycrystalline silicon films on silicon substrates with controllable film stress Gang Wang, Jeffrey L. Libbert, Shawn George Thomas 2019-05-07
10269617 High resistivity silicon-on-insulator substrate comprising an isolation region Jeffrey L. Libbert 2019-04-23
10083855 Method of manufacturing high resistivity SOI wafers with charge trapping layers based on terminated Si deposition Illaria Katia Marianna Pellicano 2018-09-25
10079170 High resistivity SOI wafers and a method of manufacturing thereof Srikanth Kommu, Gang Wang, Shawn George Thomas 2018-09-18
9831115 Process flow for manufacturing semiconductor on insulator structures in parallel Andrew M. Jones, Srikanth Kommu, Jeffrey L. Libbert 2017-11-28
9768056 Method of manufacturing high resistivity SOI wafers with charge trapping layers based on terminated Si deposition Illaria Katia Marianna Pellicano 2017-09-19
9640666 Integrated circuit employing variable thickness film 2017-05-02
8987102 Methods of forming a metal silicide region in an integrated circuit Michael G. Ward 2015-03-24
8802522 Methods to adjust threshold voltage in semiconductor devices Michael G. Ward, Sunny Chiang, Yen B. Ta, Andrew Darlak, Peter I. Porshnev +1 more 2014-08-12
8143138 Method for fabricating interconnect structures for semiconductor devices Ryan Patz, Jeremiah T. Pender, Michael D. Armacost 2012-03-27
8039878 Transistor having a channel with tensile strain and oriented along a crystallographic orientation with increased charge carrier mobility Thorsten Kammler, Andy Wei 2011-10-18
7902008 Methods for fabricating a stressed MOS device Mario M. Pelella 2011-03-08
7893496 Stress enhanced transistor Rohit Pal 2011-02-22
7767540 Transistor having a channel with tensile strain and oriented along a crystallographic orientation with increased charge carrier mobility Thorsten Kammler, Andy Wei 2010-08-03
7754554 Methods for fabricating low contact resistance CMOS circuits Patrick Press, Paul R. Besser 2010-07-13
7704840 Stress enhanced transistor and methods for its fabrication Rohit Pal 2010-04-27
7696534 Stressed MOS device Linda Black, Frank Wirbeleit 2010-04-13
7635648 Methods for fabricating dual material gate in a semiconductor device Victor Ku, Joe Piccirillo 2009-12-22
7605045 Field effect transistors and methods for fabricating the same Patrick Press, Rolf Stephan 2009-10-20
7534689 Stress enhanced MOS transistor and methods for its fabrication Rohit Pal, David E. Brown 2009-05-19
7494918 Semiconductor structures including multiple crystallographic orientations and methods for fabrication thereof Byeong Y. Kim, Xiaomeng Chen, Judson R. Holt, Christopher D. Sheraw, Linda Black 2009-02-24
7462524 Methods for fabricating a stressed MOS device Martin Gerhardt, David E. Brown 2008-12-09
7456058 Stressed MOS device and methods for its fabrication Linda Black, Huicai Zhong 2008-11-25