Issued Patents All Time
Showing 51–75 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8518784 | Adjusting of strain caused in a transistor channel by semiconductor material provided for threshold adjustment | Thorsten Kammler, Gunda Beernink, Carsten Reichel | 2013-08-27 |
| 8513080 | Reducing contamination in a process flow of forming a channel semiconductor alloy in a semiconductor device | Berthold Reimes, Richard J. Carter, Fernando Luiz Koch, Gisela Schammler | 2013-08-20 |
| 8513074 | Reduced threshold voltage-width dependency and reduced surface topography in transistors comprising high-k metal gate electrode structures by a late carbon incorporation | Peter Javorka | 2013-08-20 |
| 8497180 | Transistor with boot shaped source/drain regions | Peter Javorka, Matthias Kessler, Roman Boschke | 2013-07-30 |
| 8486786 | Enhancing uniformity of a channel semiconductor alloy by forming STI structures after the growth process | Martin Trentzsch, Richard J. Carter | 2013-07-16 |
| 8486768 | Semiconductor device comprising high-k metal gate electrode structures and precision eFuses formed in the active semiconductor material | Andreas Kurz | 2013-07-16 |
| 8481381 | Superior integrity of high-k metal gate stacks by preserving a resist material above end caps of gate electrode structures | Peter Javorka, Maciej Wiatr | 2013-07-09 |
| 8466520 | Transistor with an embedded strain-inducing material having a gradually shaped configuration | Vassilios Papageorgiou, Gunda Beernink | 2013-06-18 |
| 8460980 | Transistor comprising an embedded semiconductor alloy in drain and source regions extending under the gate electrode | Maciej Wiatr, Matthias Kessler | 2013-06-11 |
| 8445378 | Method of manufacturing a CMOS device including molecular storage elements in a via level | Markus Lenski, Ralf Richter | 2013-05-21 |
| 8440561 | Three-dimensional semiconductor device comprising an inter-die connection on the basis of functional molecules | Markus Lenski, Ralf Richter | 2013-05-14 |
| 8377786 | Methods for fabricating semiconductor devices | Peter Javorka, Roman Boschke | 2013-02-19 |
| 8361858 | Reduction of thickness variations of a threshold semiconductor alloy by reducing patterning non-uniformities prior to depositing the semiconductor alloy | Andreas Naumann, Gunda Beernink | 2013-01-29 |
| 8357573 | Strain enhancement in transistors comprising an embedded strain-inducing semiconductor alloy by creating a patterning non-uniformity at the bottom of the gate electrode | Markus Lenski, Vassilios Papageorgiou | 2013-01-22 |
| 8349694 | Enhanced confinement of high-K metal gate electrode structures by reducing material erosion of a dielectric cap layer upon forming a strain-inducing semiconductor alloy | Markus Lenski, Andy Wei, Martin Gerhardt | 2013-01-08 |
| 8343826 | Method for forming a transistor comprising high-k metal gate electrode structures including a polycrystalline semiconductor material and embedded strain-inducing semiconductor alloys | Peter Javorka, Maciej Wiatr | 2013-01-01 |
| 8338892 | Strain enhancement in transistors comprising an embedded strain-inducing semiconductor alloy by corner rounding at the top of the gate electrode | Roman Boschke, Maciej Wiatr, Peter Javorka | 2012-12-25 |
| 8338274 | Transistor device comprising an embedded semiconductor alloy having an asymmetric configuration | Vassilios Papageorgiou, Gunda Beernink, Jan Hoentschel | 2012-12-25 |
| 8334185 | Early embedded silicon germanium with insitu boron doping and oxide/nitride proximity spacer | Matthias Kessler, Ricardo Pablo. Mikalo | 2012-12-18 |
| 8334573 | Buried etch stop layer in trench isolation structures for superior surface planarity in densely packed semiconductor devices | Maciej Wiatr, Markus Forsberg, Roman Boschke | 2012-12-18 |
| 8324119 | Enhancing deposition uniformity of a channel semiconductor alloy by an in situ etch process | Carsten Reichel, Thorsten Kammler, Annekathrin Zeun | 2012-12-04 |
| 8293596 | Formation of a channel semiconductor alloy by depositing a hard mask for the selective epitaxial growth | Carsten Reichel, Annekathrin Zeun, Thorsten Kammler | 2012-10-23 |
| 8283225 | Enhancing selectivity during formation of a channel semiconductor alloy by a wet oxidation process | Carsten Reichel, Falk Graetshe, Boris Bayha | 2012-10-09 |
| 8258053 | Performance enhancement in transistors comprising high-K metal gate stack by reducing a width of offset spacers | Matthias Kessler, Andreas Kurz | 2012-09-04 |
| 8247282 | Enhancing interface characteristics between a channel semiconductor alloy and a gate dielectric by an oxidation process | Carsten Reichel, Annekathrin Zeun, Martin Trentzsch | 2012-08-21 |