Issued Patents All Time
Showing 51–71 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10056486 | Methods for fin thinning providing improved SCE and S/D EPI growth | Pei Zhao, Zhenyu Hu | 2018-08-21 |
| 10002793 | Sub-fin doping method | Jiehui Shu, David Paul Brunco, Jinping Liu, Baofu Zhu | 2018-06-19 |
| 10002797 | Chip integration including vertical field-effect transistors and bipolar junction transistors | — | 2018-06-19 |
| 9966313 | FinFET device and method of manufacturing | Baofu Zhu, Srikanth B. Samavedam | 2018-05-08 |
| 9966433 | Multiple-step epitaxial growth S/D regions for NMOS FinFET | Zhiqing Li, Francis Benistant | 2018-05-08 |
| 9960113 | Method to fabricate a high performance capacitor in a back end of line (BEOL) | Sunil Kumar Singh | 2018-05-01 |
| 9947788 | Device with diffusion blocking layer in source/drain region | Pei Zhao, Baofu Zhu, Francis Benistant | 2018-04-17 |
| 9923046 | Semiconductor device resistor structure | Hui Zang, Josef S. Watts | 2018-03-20 |
| 9711346 | Method to fabricate a high performance capacitor in a back end of line (BEOL) | Sunil Kumar Singh | 2017-07-18 |
| 9679990 | Semiconductor structure(s) with extended source/drain channel interfaces and methods of fabrication | Edmund K. Banghart, Mitsuhiro Togo | 2017-06-13 |
| 9647145 | Method, apparatus, and system for increasing junction electric field of high current diode | Jagar Singh, Josef S. Watts | 2017-05-09 |
| 9577040 | FinFET conformal junction and high epi surface dopant concentration method and device | Peijie Feng, Jianwei Peng, Yanxiang Liu, Francis Benistant | 2017-02-21 |
| 9559176 | FinFET conformal junction and abrupt junction with reduced damage method and device | Peijie Feng, Yanxiang Liu, Jianwei Peng, Francis Benistant | 2017-01-31 |
| 9543297 | Fin-FET replacement metal gate structure and method of manufacturing the same | Xusheng Wu, Konstantin G. Korablev, Manfred Eller | 2017-01-10 |
| 9419082 | Source/drain profile engineering for enhanced p-MOSFET | Shiv Kumar Mishra, Zhiqing Li, Scott Beasor | 2016-08-16 |
| 9406752 | FinFET conformal junction and high EPI surface dopant concentration method and device | Peijie Feng, Jianwei Peng, Yanxiang Liu, Francis Benistant | 2016-08-02 |
| 9397162 | FinFET conformal junction and abrupt junction with reduced damage method and device | Peijie Feng, Yanxiang Liu, Jianwei Peng, Francis Benistant | 2016-07-19 |
| 9087860 | Fabricating fin-type field effect transistor with punch-through stop region | Edmund K. Banghart, Yanxiang Liu | 2015-07-21 |
| 8946039 | Polysilicon resistor formation | Jagar Singh, Roderick Miller, Nam Sung Kim | 2015-02-03 |
| 8828834 | Methods of tailoring work function of semiconductor devices with high-k/metal layer gate structures by performing a fluorine implant process | Shiang Yang Ong, Jan Hoentschel | 2014-09-09 |
| 8153537 | Method for fabricating semiconductor devices using stress engineering | Sai-Hooi Yeong, Tao Wang, Chia Ching Yeo, Ying-Keung Leung, Elgin Quek | 2012-04-10 |