Issued Patents All Time
Showing 226–250 of 294 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8399867 | Extreme ultraviolet light source apparatus | Akira Endo, Shinji Nagai, Kouji Kakizaki, Yoshifumi Ueno | 2013-03-19 |
| 8395133 | Apparatus and method of adjusting a laser light source for an EUV source device | Masato Moriya, Hideo Hoshino, Hakaru Mizoguchi | 2013-03-12 |
| 8311066 | Laser apparatus and extreme ultraviolet light source apparatus | Nowak Krzysztof, Takeshi Ohta | 2012-11-13 |
| 8294129 | Extreme ultraviolet light source apparatus | Masato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu +1 more | 2012-10-23 |
| 8288743 | Apparatus for and method of withdrawing ions in EUV light production apparatus | Yoshifumi Ueno, Tamotsu Abe, Akira Sumitani, Hideo Hoshino, Akira Endo +1 more | 2012-10-16 |
| 8242472 | Extreme ultraviolet light source device and control method for extreme ultraviolet light source device | Masato Moriya | 2012-08-14 |
| 8242474 | Extreme ultraviolet light generation apparatus | Shinji Nagai, Tamotsu Abe, Takanobu Ishihara | 2012-08-14 |
| 8227778 | Semiconductor exposure device using extreme ultra violet radiation | Masato Moriya, Georg Soumagne | 2012-07-24 |
| 8198613 | Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device | Masato Moriya, Georg Soumagne | 2012-06-12 |
| 8173984 | Extreme ultraviolet light source apparatus | Masato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu +1 more | 2012-05-08 |
| 8164076 | Extreme ultraviolet light source apparatus and method of generating extreme ultraviolet light | Akira Endo, Yoshifumi Ueno, Youichi Sasaki | 2012-04-24 |
| 8165181 | Polarization purity control device and gas laser apparatus provided with the same | Shinji Nagai, Fumika Yoshida, Kouji Kakizaki | 2012-04-24 |
| 8116347 | Two-stage laser system for aligners | Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano | 2012-02-14 |
| 8093571 | Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device | Akira Endo, Krzysztof Nowak, Hideo Hoshino, Tatsuya Ariga, Masato Moriya | 2012-01-10 |
| 8000361 | Laser system | Tamotsu Abe, Hideo Hoshino, Akira Endo, Kouji Kakizaki | 2011-08-16 |
| 7965756 | Optical element for gas laser and gas laser apparatus using the same | Shinji Nagai, Kouji Kakizaki, Satoshi Tanaka | 2011-06-21 |
| 7957449 | Two-stage laser system for aligners | Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano | 2011-06-07 |
| 7923705 | Extreme ultra violet light source apparatus | Masato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu +1 more | 2011-04-12 |
| 7915600 | Extreme ultra violet light source apparatus | Yoshifumi Ueno, Georg Soumagne, Akira Sumitani | 2011-03-29 |
| 7903700 | Narrow-spectrum laser device | Shinji Nagai, Koji Kakizaki, Takayuki Yabu, Takahito Kumazaki | 2011-03-08 |
| 7903715 | Slab type laser apparatus | Krzysztof Nowak, Takashi Suganuma, Akira Endo | 2011-03-08 |
| 7792176 | Narrow-band laser device for exposure apparatus | — | 2010-09-07 |
| 7756183 | Line narrowed laser apparatus | Takahito Kumazaki | 2010-07-13 |
| 7382816 | Two-stage laser pulse energy control device and two-stage laser system | Tatsuya Ariga, Kouji Kakizaki | 2008-06-03 |
| 7072375 | Line-narrowed gas laser system | Tatsuya Ariga, Kyohei Seki | 2006-07-04 |