Issued Patents All Time
Showing 51–72 of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8558202 | Extreme ultraviolet light source apparatus | Tatsuya Yanagida, Akira Endo, Hiroshi Komori, Shinji Nagai, Tamotsu Abe +1 more | 2013-10-15 |
| 8530869 | Extreme ultraviolet light source apparatus | Shinji Nagai, Takanobu Ishihara, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue | 2013-09-10 |
| 8530870 | Extreme ultraviolet light source apparatus | Shinji Nagai, Tatsuya Yanagida | 2013-09-10 |
| 8507883 | Extreme ultraviolet light source apparatus | Akira Endo, Hideo Hoshino, Tamotsu Abe, Akira Sumitani, Takanobu Ishihara +3 more | 2013-08-13 |
| 8503499 | Gas discharge chamber | Shinji Nagai, Fumika Yoshida, Osamu Wakabayashi | 2013-08-06 |
| 8498317 | Temperature controller for gas laser | Yukio Watanabe, Hideyuki Hayashi, Michio Shinozaki, Hideo Hoshino | 2013-07-30 |
| 8497489 | Chamber apparatus and method of maintaining target supply unit | Takayuki Yabu, Yukio Watanabe, Osamu Wakabayashi | 2013-07-30 |
| 8445876 | Extreme ultraviolet light source apparatus | Takashi Suganuma, Masato Moriya, Tamotsu Abe, Osamu Wakabayashi | 2013-05-21 |
| 8436328 | Extreme ultraviolet light source apparatus | Tatsuya Yanagida, Akira Endo, Hiroshi Komori, Shinji Nagai, Tamotsu Abe +1 more | 2013-05-07 |
| 8399867 | Extreme ultraviolet light source apparatus | Akira Endo, Shinji Nagai, Osamu Wakabayashi, Yoshifumi Ueno | 2013-03-19 |
| 8324600 | Apparatus and method for measuring and controlling target trajectory in chamber apparatus | Hideyuki Hayashi, Tooru Abe, Toshihiro Nishisaka | 2012-12-04 |
| 8238392 | Temperature controller for gas laser | Yukio Watanabe, Hideyuki Hayashi, Michio Shinozaki, Hideo Hoshino | 2012-08-07 |
| 8165181 | Polarization purity control device and gas laser apparatus provided with the same | Shinji Nagai, Fumika Yoshida, Osamu Wakabayashi | 2012-04-24 |
| 8158959 | Extreme ultraviolet light source apparatus | Takeshi Asayama, Akira Endo, Shinji Nagai | 2012-04-17 |
| 8003963 | Extreme ultraviolet light source apparatus | Shinji Nagai, Takanobu Ishihara, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue | 2011-08-23 |
| 7999241 | Extreme ultraviolet light source apparatus | Shinji Nagai, Takanobu Ishihara, Tamotsu Abe | 2011-08-16 |
| 8000361 | Laser system | Tamotsu Abe, Hideo Hoshino, Akira Endo, Osamu Wakabayashi | 2011-08-16 |
| 7965756 | Optical element for gas laser and gas laser apparatus using the same | Osamu Wakabayashi, Shinji Nagai, Satoshi Tanaka | 2011-06-21 |
| 7782922 | Excimer laser device operable at high repetition rate and having high band-narrowing efficiency | Tsukasa HORI, Takanobu Ishihara | 2010-08-24 |
| 7382816 | Two-stage laser pulse energy control device and two-stage laser system | Tatsuya Ariga, Osamu Wakabayashi | 2008-06-03 |
| 7215695 | Discharge excitation type pulse laser apparatus | Youichi Sasaki, Naoki Kataoka | 2007-05-08 |
| 6922428 | Gas laser apparatus for lithography | Satoshi Tanaka, Youichi Sasaki | 2005-07-26 |