Issued Patents All Time
Showing 26–47 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8895889 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Ezra Robert Gold, Ajit Balakrishna, James P. Cruse | 2014-11-25 |
| 8801893 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Paul Brillhart, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2014-08-12 |
| 8608900 | Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes | Douglas A. Buchberger, Jr., Paul Brillhart, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +1 more | 2013-12-17 |
| 8596336 | Substrate support temperature control | Paul Brillhart, Sang In Yi, Anisul Khan, Jivko Dinev, Shane C. Nevil | 2013-12-03 |
| 8546267 | Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control | Paul Brillhart, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2013-10-01 |
| 8337660 | Capacitively coupled plasma reactor having very agile wafer temperature control | Douglas A. Buchberger, Jr., Paul Brillhart, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2012-12-25 |
| 8329586 | Method of processing a workpiece in a plasma reactor using feed forward thermal control | Douglas A. Buchberger, Jr., Paul Brillhart, Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2012-12-11 |
| 8221580 | Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops | Douglas A. Buchberger, Jr., Paul Brillhart, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2012-07-17 |
| 8157951 | Capacitively coupled plasma reactor having very agile wafer temperature control | Douglas A. Buchberger, Jr., Paul Brillhart, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +1 more | 2012-04-17 |
| 8092639 | Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes | Douglas A. Buchberger, Jr., Paul Brillhart, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2012-01-10 |
| 8092638 | Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution | Paul Brillhart, Hamid Tavassoli, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera +1 more | 2012-01-10 |
| 8074677 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2011-12-13 |
| 8034180 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Paul Brillhart, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera, Daniel J. Hoffman | 2011-10-11 |
| 8021521 | Method for agile workpiece temperature control in a plasma reactor using a thermal model | Douglas A. Buchberger, Jr., Paul Brillhart, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2011-09-20 |
| 8012304 | Plasma reactor with a multiple zone thermal control feed forward control apparatus | Paul Brillhart, Hamid Tavassoli, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera +1 more | 2011-09-06 |
| 7988872 | Method of operating a capacitively coupled plasma reactor with dual temperature control loops | Paul Brillhart, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2011-08-02 |
| 7975558 | Method and apparatus for gas flow measurement | Jared Ahmad Lee, Ezra Robert Gold, Chunlei Zhang, James P. Cruse | 2011-07-12 |
| 7846497 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2010-12-07 |
| 7775236 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2010-08-17 |
| 7743670 | Method and apparatus for gas flow measurement | Jared Lee, Ezra Robert Gold, Chunlei Zhang, James P. Cruse | 2010-06-29 |
| 6916399 | Temperature controlled window with a fluid supply system | Yan Rozenzon, Gil Lavi, Evans Lee, Dong Ho Choi, Matt Hamrah +3 more | 2005-07-12 |
| 4960569 | Corona discharge ozonator with cooled flow path | Jan M. Heinemann, Klaus Heinemann | 1990-10-02 |