Issued Patents All Time
Showing 51–60 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6267853 | Electro-chemical deposition system | Yezdi Dordi, Muhammad Malik, Henan Hao, Timothy Franklin, Joe Stevens | 2001-07-31 |
| 6258220 | Electro-chemical deposition system | Yezdi Dordi, Ratson Morad, Peter Hey, Mark Denome, Michael Sugarman +10 more | 2001-07-10 |
| 6071372 | RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls | Yan Ye, Avi Tepman, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt +2 more | 2000-06-06 |
| 5885358 | Gas injection slit nozzle for a plasma process reactor | Dan Maydan, Steve S. Y. Mak, Gerald Yin, Timothy D. Driscoll, James S. Papanu +1 more | 1999-03-23 |
| 5883017 | Compartmentalized substrate processing chamber | Avi Tepman, Gerald Yin | 1999-03-16 |
| 5817534 | RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers | Yan Ye, Hiroji Hanawa, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt +2 more | 1998-10-06 |
| 5746875 | Gas injection slit nozzle for a plasma process reactor | Dan Maydan, Steve S. Y. Mak, Gerald Yin, Timothy D. Driscoll, James S. Papanu +1 more | 1998-05-05 |
| 5730801 | Compartnetalized substrate processing chamber | Avi Tepman, Gerald Yin | 1998-03-24 |
| 5643394 | Gas injection slit nozzle for a plasma process reactor | Dan Maydan, Steve S. Y. Mak, Gerald Yin, Timothy D. Driscoll, Brian Sy-Yuan Shieh +1 more | 1997-07-01 |
| 5540824 | Plasma reactor with multi-section RF coil and isolated conducting lid | Gerald Yin, Hiroji Hanawa, Diana Xiabing Ma | 1996-07-30 |