Issued Patents 2022
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11538663 | Methods and apparatus for processing a substrate | John Poulose | 2022-12-27 |
| 11532497 | High power electrostatic chuck design with radio frequency coupling | Jaeyong Cho, Vijay D. Parkhe, Haitao Wang, Chunlei Zhang | 2022-12-20 |
| 11499223 | Continuous liner for use in a processing chamber | James D. Carducci, Kenneth S. Collins | 2022-11-15 |
| 11488852 | Methods and apparatus for reducing high voltage arcing in semiconductor process chambers | Anwar Husain, Hamid Noorbakhsh | 2022-11-01 |
| 11476090 | Voltage pulse time-domain multiplexing | Yang Yang, Yue Guo | 2022-10-18 |
| 11469097 | Carbon hard masks for patterning applications and methods related thereto | Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Takehito Koshizawa, Abhijit Basu Mallick | 2022-10-11 |
| 11462386 | Electron beam apparatus for optical device fabrication | Yang Yang, Manivannan Thothadri, Chien-An Chen, Ludovic Godet, Rutger Meyer Timmerman Thijssen | 2022-10-04 |
| 11462388 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2022-10-04 |
| 11462389 | Pulsed-voltage hardware assembly for use in a plasma processing system | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +5 more | 2022-10-04 |
| 11448977 | Gas distribution plate with UV blocker at the center | Michael D. Willwerth, Yang Yang | 2022-09-20 |
| 11447868 | Method for controlling a plasma process | Andrew Nguyen, Michael G. Chafin, Yang Yang, Anilkumar Rayaroth, Lu Liu | 2022-09-20 |
| 11446740 | Multiple sequential linear powder dispensers for additive manufacturing | Christopher A. Rowland, Anantha K. Subramani, Kasiraman Krishnan, Thomas Brezoczky, Swaminathan Srinivasan +5 more | 2022-09-20 |
| 11430634 | Methods of optical device fabrication using an electron beam apparatus | Ludovic Godet, Rutger Meyer Timmerman Thijssen, Yang Yang, Manivannan Thothadri, Chien-An Chen | 2022-08-30 |
| 11424096 | Temperature controlled secondary electrode for ion control at substrate edge | Hamid Noorbakhsh, Anwar Husain | 2022-08-23 |
| 11424104 | Plasma reactor with electrode filaments extending from ceiling | Kenneth S. Collins, Michael R. Rice, James D. Carducci | 2022-08-23 |
| 11355321 | Plasma reactor with electrode assembly for moving substrate | Kenneth S. Collins, Michael R. Rice, James D. Carducci | 2022-06-07 |
| 11315760 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2022-04-26 |