Issued Patents 2022
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11488812 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Changhun Lee, Xiaoming He, Meihua Shen | 2022-11-01 |
| 11447868 | Method for controlling a plasma process | Kartik Ramaswamy, Michael G. Chafin, Yang Yang, Anilkumar Rayaroth, Lu Liu | 2022-09-20 |
| 11333246 | Chamber body design architecture for next generation advanced plasma technology | Bradley J. Howard, Nicolas Bright | 2022-05-17 |
| 11315760 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2022-04-26 |