Issued Patents 2022
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11488812 | Method and apparatus for reducing particle defects in plasma etch chambers | Andrew Nguyen, Changhun Lee, Xiaoming He, Meihua Shen | 2022-11-01 |
| 11462411 | Gate contact over active regions | Gaurav Thareja, Keyvan Kashefizadeh, Anchuan Wang, Sanjay Natarajan, Sean M. Seutter +1 more | 2022-10-04 |