Issued Patents 2019
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504759 | Semiconductor metrology with information from multiple processing steps | Alexander Kuznetsov, Antonio Arion Gellineau | 2019-12-10 |
| 10502694 | Methods and apparatus for patterned wafer characterization | Thaddeus Gerard Dziura, Stilian Ivanov Pandev, Alexander Kuznetsov | 2019-12-10 |
| 10490462 | Metrology systems and methods for process control | Stilian Ivanov Pandev, Dzmitry Sanko | 2019-11-26 |
| 10458912 | Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity | Houssam Chouaib, Qiang Zhao, Zhengquan Tan | 2019-10-29 |
| 10438825 | Spectral reflectometry for in-situ process monitoring and control | Prateek Jain, Daniel Wack, Kevin Peterlinz, Shankar Krishnan | 2019-10-08 |
| 10401738 | Overlay metrology using multiple parameter configurations | Andrew V. Hill, Amnon Manassen, Noam Sapiens | 2019-09-03 |
| 10352876 | Signal response metrology for scatterometry based overlay measurements | Stilian Ivanov Pandev, Jonathan M. Madsen, Alexander Kuznetsov, Walter D. Mieher | 2019-07-16 |
| 10352695 | X-ray scatterometry metrology for high aspect ratio structures | Thaddeus Gerard Dziura, Antonio Arion Gellineau | 2019-07-16 |
| 10345095 | Model based measurement systems with improved electromagnetic solver performance | Stilian Ivanov Pandev, Leonid Poslavsky, Dzmitry Sanko | 2019-07-09 |
| 10324050 | Measurement system optimization for X-ray based metrology | John J. Hench, Michael S. Bakeman | 2019-06-18 |
| 10215688 | Optical metrology tool equipped with modulated illumination sources | Lawrence D. Rotter, David Y. Wang, Andrei Veldman, Kevin Peterlinz, Gregory Brady +1 more | 2019-02-26 |
| 10203247 | Systems for providing illumination in optical metrology | Gregory Brady, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin, Ilya Bezel +16 more | 2019-02-12 |