Issued Patents 2019
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10502694 | Methods and apparatus for patterned wafer characterization | Thaddeus Gerard Dziura, Alexander Kuznetsov, Andrei V. Shchegrov | 2019-12-10 |
| 10502549 | Model-based single parameter measurement | — | 2019-12-10 |
| 10490462 | Metrology systems and methods for process control | Dzmitry Sanko, Andrei V. Shchegrov | 2019-11-26 |
| 10386729 | Dynamic removal of correlation of highly correlated parameters for optical metrology | Lie-Quan Lee, Leonid Poslavsky | 2019-08-20 |
| 10380728 | Model-based metrology using images | — | 2019-08-13 |
| 10365225 | Multi-location metrology | Wei Lu | 2019-07-30 |
| 10352876 | Signal response metrology for scatterometry based overlay measurements | Andrei V. Shchegrov, Jonathan M. Madsen, Alexander Kuznetsov, Walter D. Mieher | 2019-07-16 |
| 10354929 | Measurement recipe optimization based on spectral sensitivity and process variation | — | 2019-07-16 |
| 10345095 | Model based measurement systems with improved electromagnetic solver performance | Leonid Poslavsky, Dzmitry Sanko, Andrei V. Shchegrov | 2019-07-09 |
| 10295342 | System, method and computer program product for calibration of metrology tools | Dzmitry Sanko | 2019-05-21 |
| 10255385 | Model optimization approach based on spectral sensitivity | Thaddeus Gerard Dziura, Meng-Fu Shih, Lie-Quan Lee | 2019-04-09 |
| 10234271 | Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector | Jiyou Fu, Noam Sapiens, Kevin Peterlinz | 2019-03-19 |
| 10215559 | Metrology of multiple patterning processes | Dzmitry Sanko, Alexander Kuznetsov | 2019-02-26 |
| 10216096 | Process-sensitive metrology systems and methods | Myungjun Lee, Mark D. Smith, Sanjay Kapasi, Dzmitry Sanko, Pradeep Subrahmanyan +1 more | 2019-02-26 |
| 10210606 | Signal response metrology for image based and scatterometry overlay measurements | Dzmitry Sanko, Wei Lu, Siddharth Srivastava | 2019-02-19 |