AM

Amnon Manassen

KL Kla-Tencor: 13 patents #3 of 446Top 1%
📍 Haifa, CA: #3 of 29 inventorsTop 15%
Overall (2019): #5,452 of 560,194Top 1%
13
Patents 2019

Issued Patents 2019

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
10520832 Topographic phase control for overlay measurement Vladimir Levinski, Yuri Paskover, Yoni Shalibo 2019-12-31
10458777 Polarization measurements of metrology targets and corresponding target designs Eran Amit, Barry Loevsky, Andrew V. Hill, Nuriel Amir, Vladimir Levinski +1 more 2019-10-29
10444161 Systems and methods for metrology with layer-specific illumination spectra Daria Negri, Andrew V. Hill, Ohad Bachar, Vladimir Levinski, Yuri Paskover 2019-10-15
10422508 System and method for spectral tuning of broadband light sources Andrew V. Hill, Ohad Bachar 2019-09-24
10409171 Overlay control with non-zero offset prediction Michael Adel, William Pierson, Ady Levy, Pradeep Subrahmanyan, Liran Yerushalmi +4 more 2019-09-10
10401228 Simultaneous capturing of overlay signals from multiple targets Andrew V. Hill, Yuri Paskover, Yuval Lubashevsky 2019-09-03
10401738 Overlay metrology using multiple parameter configurations Andrew V. Hill, Andrei V. Shchegrov, Noam Sapiens 2019-09-03
10371626 System and method for generating multi-channel tunable illumination from a broadband source Andrew V. Hill, Ohad Bachar 2019-08-06
10261014 Near field metrology Noam Sapiens, Joel Seligson, Vladimir Levinski, Daniel Kandel, Yoel Feler +2 more 2019-04-16
10242290 Method, system, and user interface for metrology target characterization Inna Tarshish-Shapir, Yoel Feler, Anat Marchelli, Berta Dinu, Vladimir Levinski +4 more 2019-03-26
10203247 Systems for providing illumination in optical metrology Gregory Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin +16 more 2019-02-12
10197389 Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields Vladimir Levinski, Yuri Paskover, Yuval Lubashevsky 2019-02-05
10190979 Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures Yuri Paskover, Barry Loevsky, Daria Negri 2019-01-29