Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10475712 | System and method for process-induced distortion prediction during wafer deposition | Mark D. Smith | 2019-11-12 |
| 10466596 | System and method for field-by-field overlay process control using measured and estimated field parameters | Bill Pierson, Ramkumar Karur-Shanmugam, Chin-Chou Huang, John Robinson | 2019-11-05 |
| 10451412 | Apparatus and methods for detecting overlay errors using scatterometry | Michael Adel, Walter D. Mieher, Ibrahim Abdulhalim, Michael Friedmann | 2019-10-22 |
| 10409171 | Overlay control with non-zero offset prediction | Michael Adel, Amnon Manassen, William Pierson, Pradeep Subrahmanyan, Liran Yerushalmi +4 more | 2019-09-10 |
| 10216096 | Process-sensitive metrology systems and methods | Myungjun Lee, Mark D. Smith, Sanjay Kapasi, Stilian Ivanov Pandev, Dzmitry Sanko +1 more | 2019-02-26 |