Issued Patents 2019
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10520832 | Topographic phase control for overlay measurement | Yuri Paskover, Amnon Manassen, Yoni Shalibo | 2019-12-31 |
| 10458777 | Polarization measurements of metrology targets and corresponding target designs | Eran Amit, Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir +1 more | 2019-10-29 |
| 10444161 | Systems and methods for metrology with layer-specific illumination spectra | Amnon Manassen, Daria Negri, Andrew V. Hill, Ohad Bachar, Yuri Paskover | 2019-10-15 |
| 10337991 | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination | — | 2019-07-02 |
| 10261014 | Near field metrology | Noam Sapiens, Joel Seligson, Daniel Kandel, Yoel Feler, Barak Bringoltz +2 more | 2019-04-16 |
| 10242290 | Method, system, and user interface for metrology target characterization | Inna Tarshish-Shapir, Yoel Feler, Anat Marchelli, Berta Dinu, Boris Efraty +4 more | 2019-03-26 |
| 10228320 | Achieving a small pattern placement error in metrology targets | Daniel Kandel | 2019-03-12 |
| 10197389 | Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields | Yuri Paskover, Yuval Lubashevsky, Amnon Manassen | 2019-02-05 |
| 10197922 | Focus metrology and targets which utilize transformations based on aerial images of the targets | Nadav Gutman, Yoel Feler, Oded Kaminsky | 2019-02-05 |