Issued Patents 2019
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504802 | Target location in semiconductor manufacturing | Naomi Ittah, Nadav Gutman, Vincent Immer, Einat Peled | 2019-12-10 |
| 10473460 | Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals | Nadav Gutman, Stefan Eyring, Hari Pathangi, Frank Laske, Ulrich Pohlmann +1 more | 2019-11-12 |
| 10458777 | Polarization measurements of metrology targets and corresponding target designs | Barry Loevsky, Andrew V. Hill, Amnon Manassen, Nuriel Amir, Vladimir Levinski +1 more | 2019-10-29 |
| 10415963 | Estimating and eliminating inter-cell process variation inaccuracy | Tal Marciano, Barak Bringoltz, Nuriel Amir, Amit Shaked | 2019-09-17 |
| 10401841 | Identifying registration errors of DSA lines | Roie Volkovich, Raviv Yohanan | 2019-09-03 |
| 10365230 | Scatterometry overlay based on reflection peak locations | Tzahi Grunzweig | 2019-07-30 |
| 10331050 | Lithography systems with integrated metrology tools having enhanced functionalities | Roie Volkovich, Liran Yerushalmi | 2019-06-25 |
| 10303835 | Method and apparatus for direct self assembly in target design and production | Raviv Yohanan, Tal Itzkovich, Nuriel Amir, Roie Volkovich, DongSub Choi | 2019-05-28 |
| 10274837 | Metrology target for combined imaging and scatterometry metrology | Raviv Yohanan | 2019-04-30 |