Issued Patents 2019
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10475660 | Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme | Cheng Chi, Fee Li Lie, Ruilong Xie | 2019-11-12 |
| 10475905 | Techniques for vertical FET gate length control | Chun Wing Yeung, Robin Hsin Kuo Chao, Zhenxing Bi, Kristin Schmidt, Yann Mignot | 2019-11-12 |
| 10461154 | Bottom isolation for nanosheet transistors on bulk substrate | Yi Song, Zhenxing Bi, Shogo Mochizuki | 2019-10-29 |
| 10431646 | Electronic devices having spiral conductive structures | Peng Xu, Kangguo Cheng, Xuefeng Liu, Yongan Xu | 2019-10-01 |
| 10411120 | Self-aligned inner-spacer replacement process using implantation | Robin Hsin Kuo Chao, Michael A. Guillorn, Shogo Mochizuki, Chun Wing Yeung | 2019-09-10 |
| 10410875 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Nelson Felix, Yann Mignot, Stuart A. Sieg | 2019-09-10 |
| 10395939 | Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme | Cheng Chi, Fee Li Lie, Ruilong Xie | 2019-08-27 |
| 10381267 | Field effect device with reduced capacitance and resistance in source/drain contacts at reduced gate pitch | Kangguo Cheng, Peng Xu | 2019-08-13 |
| 10374034 | Undercut control in isotropic wet etch processes | Muthumanickam Sankarapandian, Kristin Schmidt, Ekmini Anuja De Silva, Noel Arellano, Robin Hsin Kuo Chao +2 more | 2019-08-06 |
| 10361116 | Design-aware pattern density control in directed self-assembly graphoepitaxy process | Hsueh-Chung Chen, Cheng Chi, Lin Hu, Kafai Lai, Jed W. Pitera | 2019-07-23 |
| 10340179 | Via formation using directed self-assembly of a block copolymer | Cheng Chi, Kafai Lai, Yongan Xu | 2019-07-02 |
| 10312103 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Nelson Felix, Yann Mignot, Stuart A. Sieg | 2019-06-04 |
| 10276695 | Self-aligned inner-spacer replacement process using implantation | Robin Hsin Kuo Chao, Michael A. Guillorn, Shogo Mochizuki, Chun Wing Yeung | 2019-04-30 |
| 10263099 | Self-aligned finFET formation | Cheng Chi, Fee Li Lie, Ruilong Xie | 2019-04-16 |
| 10256289 | Efficient metal-insulator-metal capacitor fabrication | Kisup Chung, Isabel C. Estrada-Raygoza, Hemanth Jagannathan, Yann Mignot, Hao Tang | 2019-04-09 |
| 10256320 | Vertical field-effect-transistors having a silicon oxide layer with controlled thickness | Sanjay C. Mehta, Luciana Meli, Muthumanickam Sankarapandian, Kristin Schmidt, Ankit Vora | 2019-04-09 |
| 10242983 | Semiconductor device with increased source/drain area | Kangguo Cheng, Peng Xu, Jie Yang | 2019-03-26 |
| 10242881 | Self-aligned single dummy fin cut with tight pitch | Kangguo Cheng, Cheng Chi, Peng Xu | 2019-03-26 |
| 10199464 | Techniques for VFET top source/drain epitaxy | Kangguo Cheng, Cheng Chi, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh | 2019-02-05 |
| 10170591 | Self-aligned finFET formation | Cheng Chi, Fee Li Lie, Ruilong Xie | 2019-01-01 |