Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10438855 | Dual channel FinFETs having uniform fin heights | Zhenxing Bi, Kangguo Cheng, Peng Xu | 2019-10-08 |
| 10431503 | Sacrificial cap for forming semiconductor contact | Praneet Adusumilli, Zuoguang Liu, Shogo Mochizuki, Chun Wing Yeung | 2019-10-01 |
| 10333000 | Forming strained channel with germanium condensation | Kangguo Cheng, Shogo Mochizuki | 2019-06-25 |
| 10242983 | Semiconductor device with increased source/drain area | Kangguo Cheng, Chi-Chun Liu, Peng Xu | 2019-03-26 |
| 10170586 | Unipolar spacer formation for finFETs | Kangguo Cheng, Peng Xu | 2019-01-01 |