Issued Patents 2019
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10490641 | Methods of forming a gate contact structure for a transistor | Ruilong Xie, Hao Tang, Daniel Chanemougame, Lars Liebmann, Mark V. Raymond | 2019-11-26 |
| 10483363 | Methods of forming a gate contact structure above an active region of a transistor | Ruilong Xie, Hao Tang, Daniel Chanemougame, Lars Liebmann, Mark V. Raymond | 2019-11-19 |
| 10475660 | Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme | Fee Li Lie, Chi-Chun Liu, Ruilong Xie | 2019-11-12 |
| 10461174 | Vertical field effect transistors with self aligned gate and source/drain contacts | Hao Tang, Ruilong Xie | 2019-10-29 |
| 10431651 | Nanosheet transistor with robust source/drain isolation from substrate | Robin Hsin Kuo Chao, Kangguo Cheng, Ruilong Xie, John H. Zhang | 2019-10-01 |
| 10418485 | Forming a combination of long channel devices and vertical transport Fin field effect transistors on the same substrate | Tenko Yamashita, Chen Zhang | 2019-09-17 |
| 10411127 | Forming a combination of long channel devices and vertical transport fin field effect transistors on the same substrate | Tenko Yamashita, Chen Zhang | 2019-09-10 |
| 10395939 | Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme | Fee Li Lie, Chi-Chun Liu, Ruilong Xie | 2019-08-27 |
| 10366931 | Nanosheet devices with CMOS epitaxy and method of forming | Ruilong Xie, Pietro Montanini, Tenko Yamashita, Nicolas Loubet | 2019-07-30 |
| 10361315 | Method and apparatus of fabricating source and drain epitaxy for vertical field effect transistor | Chun-Chen Yeh, Kangguo Cheng, Ruilong Xie, Tenko Yamashita, Chen Zhang | 2019-07-23 |
| 10283407 | Two-dimensional self-aligned super via integration on self-aligned gate contact | Ruilong Xie | 2019-05-07 |
| 10263099 | Self-aligned finFET formation | Fee Li Lie, Chi-Chun Liu, Ruilong Xie | 2019-04-16 |
| 10242881 | Self-aligned single dummy fin cut with tight pitch | Kangguo Cheng, Chi-Chun Liu, Peng Xu | 2019-03-26 |
| 10170591 | Self-aligned finFET formation | Fee Li Lie, Chi-Chun Liu, Ruilong Xie | 2019-01-01 |