Issued Patents 2019
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10461172 | Vertical transistors having improved gate length control using uniformly deposited spacers | Christopher J. Waskiewicz, Hemanth Jagannathan, Stuart A. Sieg | 2019-10-29 |
| 10410875 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Nelson Felix, Chi-Chun Liu, Stuart A. Sieg | 2019-09-10 |
| 10395936 | Wafer element with an adjusted print resolution assist feature | Muthumanickam Sankarapandian | 2019-08-27 |
| 10395938 | Wafer element with an adjusted print resolution assist feature | Muthumanickam Sankarapandian | 2019-08-27 |
| 10361125 | Methods and structures for forming uniform fins when using hardmask patterns | Peng Xu, Kangguo Cheng, Choonghyun Lee | 2019-07-23 |
| 10361129 | Self-aligned double patterning formed fincut | Stuart A. Sieg, Christopher J. Waskiewicz, Hemanth Jagannathan, Eric R. Miller, Indira Seshadri | 2019-07-23 |
| 10354885 | Hard masks for block patterning | Ekmini Anuja De Silva, Isabel C. Estrada-Raygoza, Indira Seshadri, Yongan Xu | 2019-07-16 |
| 10354927 | Co-integration of tensile silicon and compressive silicon germanium | Nicolas Loubet, Pierre Morin | 2019-07-16 |
| 10312103 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Nelson Felix, Chi-Chun Liu, Stuart A. Sieg | 2019-06-04 |
| 10304744 | Inverse tone direct print EUV lithography enabled by selective material deposition | Praveen Joseph, Ekmini Anuja De Silva, Fee Li Lie, Stuart A. Sieg, Indira Seshadri | 2019-05-28 |
| 10276434 | Structure and method using metal spacer for insertion of variable wide line implantation in SADP/SAQP integration | Hsueh-Chung Chen, James J. Kelly, Cornelius Brown Peethala, Lawrence A. Clevenger | 2019-04-30 |
| 10170326 | Wafer element with an adjusted print resolution assist feature | Muthumanickam Sankarapandian | 2019-01-01 |