Issued Patents 2019
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10437951 | Care area generation by detection optimized methodology | Ravi K. Bonam, Scott D. Halle, Luciana Meli | 2019-10-08 |
| 10410875 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2019-09-10 |
| 10388510 | Wet strippable OPL using reversible UV crosslinking and de-crosslinking | Ekmini Anuja De Silva, Jing Guo, Indira Seshadri | 2019-08-20 |
| 10388521 | Method to increase the lithographic process window of extreme ultra violet negative tone development resists | Martin Glodde, Dario L. Goldfarb | 2019-08-20 |
| 10354922 | Simplified block patterning with wet strippable hardmask for high-energy implantation | Ekmini Anuja De Silva, Indira Seshadri, Romain Lallement | 2019-07-16 |
| 10347486 | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography | Ekmini Anuja De Silva, Dario L. Goldfarb, Daniel A. Corliss, Rudy J. Wojtecki | 2019-07-09 |
| 10312103 | Alternating hardmasks for tight-pitch line formation | Sean D. Burns, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg | 2019-06-04 |
| 10249512 | Tunable TiOxNy hardmask for multilayer patterning | Abraham Arceo de la Pena, Ekmini Anuja De Silva, Sivananda K. Kanakasabapathy | 2019-04-02 |