| 9837254 |
Differentially pumped reactive gas injector |
Ivan L. Berry, III, Kenneth R. Reynolds |
2017-12-05 |
| 9818633 |
Equipment front end module for transferring wafers and method of transferring wafers |
Vahid Vahedi, Candi Kristoffersen, Andrew D. Bailey, III, Meihua Shen, Rangesh Raghavan +1 more |
2017-11-14 |
| 9806252 |
Dry plasma etch method to pattern MRAM stack |
Samantha Tan, Taeseung Kim, Wenbing Yang, Jeffrey Marks |
2017-10-31 |
| 9805941 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more |
2017-10-31 |
| 9779955 |
Ion beam etching utilizing cryogenic wafer temperatures |
Ivan L. Berry, III, Anthony J. Ricci |
2017-10-03 |
| 9735069 |
Method and apparatus for determining process rate |
Yassine Kabouzi, Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee |
2017-08-15 |
| 9659783 |
High aspect ratio etch with combination mask |
Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Aaron Eppler +2 more |
2017-05-23 |
| 9627608 |
Dielectric repair for emerging memory devices |
Nerissa Draeger, Diane Hymes |
2017-04-18 |
| 9609730 |
Adjustment of VUV emission of a plasma via collisional resonant energy transfer to an energy absorber gas |
Andreas Fischer |
2017-03-28 |
| 9595452 |
Residue free oxide etch |
Chih-Hsun Hsu, Meihua Shen |
2017-03-14 |
| 9583339 |
Method for forming spacers for a transistor gate |
Nicolas Posseme, Thibaut David, Olivier Joubert, Srinivas D. Nemani, Laurent Vallier |
2017-02-28 |
| 9576811 |
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) |
Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more |
2017-02-21 |
| 9570320 |
Method to etch copper barrier film |
Meihua Shen, Ji Zhu, Shuogang Huang, Baosuo Zhou, John Hoang +1 more |
2017-02-14 |
| 9553031 |
Method for integrating germanides in high performance integrated circuits |
Paul R. Besser |
2017-01-24 |
| 9536748 |
Use of ion beam etching to generate gate-all-around structure |
Ivan L. Berry, III |
2017-01-03 |
