Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9607904 | Atomic layer deposition of HfAlC as a metal gate workfunction material in MOS devices | Albert S. Lee, Kisik Choi, Edward Haywood, Hoon Kim, Salil Mujumdar | 2017-03-28 |
| 9553031 | Method for integrating germanides in high performance integrated circuits | Thorsten Lill | 2017-01-24 |