Issued Patents 2017
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9844789 | Method of forming lubricative plated layer on viscous liquid feed nozzle and viscous liquid feed nozzle | Shinpei Kakiuchi, Eijiro Furuta | 2017-12-19 |
| 9831084 | Hydroxyl group termination for nucleation of a dielectric metallic oxide | Michael P. Chudzik, Min Dai, Martin M. Frank, David F. Hilscher, Rishikesh Krishnan +3 more | 2017-11-28 |
| 9825122 | Multiple work function device using GeOx/TiN cap on work function setting metal | Pouya Hashemi, Choonghyun Lee | 2017-11-21 |
| 9824930 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2017-11-21 |
| 9793397 | Ferroelectric gate dielectric with scaled interfacial layer for steep sub-threshold slope field-effect transistor | Martin M. Frank, Vijay Narayanan | 2017-10-17 |
| 9761661 | Stacked strained and strain-relaxed hexagonal nanowires | Pouya Hashemi, John A. Ott, Alexander Reznicek | 2017-09-12 |
| 9761655 | Stacked planar capacitors with scaled EOT | Lawrence A. Clevenger, Hemanth Jagannathan, Roger A. Quon | 2017-09-12 |
| 9748348 | Fully-depleted SOI MOSFET with U-shaped channel | Robert H. Dennard, Isaac Lauer, Ramachandran Muralidhar | 2017-08-29 |
| 9748145 | Semiconductor devices with varying threshold voltage and fabrication methods thereof | Balaji Kannan, Unoh Kwon, Siddarth A. Krishnan, Vijay Narayanan | 2017-08-29 |
| 9735192 | Solid state imaging device for reducing dark current and imaging apparatus | Itaru Oshiyama, Susumu Hiyama, Tetsuji Yamaguchi, Yuko Ohgishi, Harumi Ikeda | 2017-08-15 |
| 9735250 | Stable work function for narrow-pitch devices | Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan | 2017-08-15 |
| 9735111 | Dual metal-insulator-semiconductor contact structure and formulation method | Hiroaki Niimi, Tenko Yamashita | 2017-08-15 |
| 9721842 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2017-08-01 |
| 9707957 | Hybrid vehicle | Yu Shimizu, Takeshi Kishimoto, Masaya Amano | 2017-07-18 |
| 9691662 | Field effect transistors having multiple effective work functions | Min Dai, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon | 2017-06-27 |
| 9682693 | Hybrid vehicle | Masaya Amano, Shinichiro Minegishi, Takeshi Kishimoto | 2017-06-20 |
| 9679967 | Contact resistance reduction by III-V Ga deficient surface | Kevin K. Chan, John Rozen, Jeng-Bang Yau, Yu Zhu | 2017-06-13 |
| 9653534 | Trench metal-insulator-metal capacitor with oxygen gettering layer | Eduard A. Cartier, Michael P. Chudzik, Aritra Dasgupta, Herbert L. Ho, Donghun Kang +3 more | 2017-05-16 |
| 9634116 | Method to improve reliability of high-K metal gate stacks | Eduard A. Cartier, Barry P. Linder, Vijay Narayanan | 2017-04-25 |
| 9627484 | Devices with multiple threshold voltages formed on a single wafer using strain in the high-K layer | Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan | 2017-04-18 |
| 9627378 | Methods of forming FINFETs with locally thinned channels from fins having in-situ doped epitaxial cladding | Robert H. Dennard, Isaac Lauer, Ramachandran Muralidhar, Ghavam G. Shahidi | 2017-04-18 |
| 9620384 | Control of O-ingress into gate stack dielectric layer using oxygen permeable layer | Claude Ortolland, Kai Zhao | 2017-04-11 |
| 9613866 | Gate stack formed with interrupted deposition processes and laser annealing | Aritra Dasgupta, Oleg Gluschenkov, Balaji Kannan, Unoh Kwon | 2017-04-04 |
| 9613870 | Gate stack formed with interrupted deposition processes and laser annealing | Aritra Dasgupta, Oleg Gluschenkov, Balaji Kannan, Unoh Kwon | 2017-04-04 |
| 9608066 | High-K spacer for extension-free CMOS devices with high mobility channel materials | Pouya Hashemi, Vijay Narayanan, Yanning Sun | 2017-03-28 |