| 9853127 |
Silicidation of bottom source/drain sheet using pinch-off sacrificial spacer process |
Brent A. Anderson, Terence B. Hook, Fee Li Lie, Junli Wang |
2017-12-26 |
| 9805935 |
Bottom source/drain silicidation for vertical field-effect transistor (FET) |
Brent A. Anderson, Terence B. Hook, Fee Li Lie, Junli Wang |
2017-10-31 |
| 9773893 |
Forming a sacrificial liner for dual channel devices |
Kangguo Cheng, Dechao Guo, Sivananda K. Kanakasabapathy, Peng Xu |
2017-09-26 |
| 9721848 |
Cutting fins and gates in CMOS devices |
Kangguo Cheng, Andrew M. Greene, Dechao Guo, Sivananda K. Kanakasabapathy, Gauri Karve +6 more |
2017-08-01 |
| 9721834 |
HDP fill with reduced void formation and spacer damage |
Andrew M. Greene, Balasubramanian Pranatharthiharan, Ruilong Xie |
2017-08-01 |
| 9704848 |
Electrostatic discharge devices and methods of manufacture |
Junjun Li, Theodorus E. Standaert, Tenko Yamashita |
2017-07-11 |
| 9698061 |
Polysilicon resistor formation in silicon-on-insulator replacement metal gate finFET processes |
Veeraraghavan S. Basker, Tenko Yamashita |
2017-07-04 |
| 9595599 |
Dielectric isolated SiGe fin on bulk substrate |
Shogo Mochizuki, Tenko Yamashita |
2017-03-14 |
| 9589851 |
Dipole-based contact structure to reduce metal-semiconductor contact resistance in MOSFETs |
Hui-feng Li, Vijay Narayanan, Hiroaki Niimi, Tenko Yamashita |
2017-03-07 |
| 9583563 |
Conformal doping for punch through stopper in fin field effect transistor devices |
Sivananda K. Kanakasabapathy, Fee Li Lie, Tenko Yamashita |
2017-02-28 |
| 9570574 |
Recessed metal liner contact with copper fill |
Praneet Adusumilli, Veeraraghavan S. Basker, Zuoguang Liu |
2017-02-14 |
| 9558995 |
HDP fill with reduced void formation and spacer damage |
Andrew M. Greene, Balasubramanian Pranatharthiharan, Ruilong Xie |
2017-01-31 |
| 9548379 |
Asymmetric multi-gate FinFET |
Veeraraghavan S. Basker, Andres Bryant, Sivananda K. Kanakasabapathy, Tenko Yamashita |
2017-01-17 |
| 9543435 |
Asymmetric multi-gate finFET |
Veeraraghavan S. Basker, Andres Bryant, Sivananda K. Kanakasabapathy, Tenko Yamashita |
2017-01-10 |
