Issued Patents 2011
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8070925 | Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target | Ying Rui, Karl M. Brown, John Pipitone, Lara Hawrylchak | 2011-12-06 |
| 8048806 | Methods to avoid unstable plasma states during a process transition | Michael Kutney, Gerardo Delgadino, Ezra Robert Gold, Ashok Sinha, Xiaoye Zhao +2 more | 2011-11-01 |
| 8048328 | Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Scott A. Hogenson | 2011-11-01 |
| 8034180 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Paul Brillhart, Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera | 2011-10-11 |
| 8021521 | Method for agile workpiece temperature control in a plasma reactor using a thermal model | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +5 more | 2011-09-20 |
| 8018164 | Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources | Steven C. Shannon, Kartik Ramaswamy, Matthew L. Miller, Kenneth S. Collins | 2011-09-13 |
| 8012304 | Plasma reactor with a multiple zone thermal control feed forward control apparatus | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas A. Buchberger, Jr., Douglas H. Burns +1 more | 2011-09-06 |
| 8002945 | Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator | Steven C. Shannon, Kartik Ramaswamy, Matthew L. Miller, Kenneth S. Collins | 2011-08-23 |
| 7988872 | Method of operating a capacitively coupled plasma reactor with dual temperature control loops | Paul Brillhart, Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera +4 more | 2011-08-02 |
| 7972968 | High density plasma gapfill deposition-etch-deposition process etchant | Young S. Lee, Ying Rui, Dmitry Lubomirsky, Jang-Gyoo Yang, Anchuan Wang | 2011-07-05 |
| 7972467 | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor | Kallol Bera, Yan Ye, James D. Carducci, Steven C. Shannon, Douglas A. Buchberger, Jr. | 2011-07-05 |
| 7967944 | Method of plasma load impedance tuning by modulation of an unmatched low power RF generator | Steven C. Shannon, Kartik Ramaswamy, Matthew L. Miller, Kenneth S. Collins | 2011-06-28 |
| 7955986 | Capacitively coupled plasma reactor with magnetic plasma control | Matthew L. Miller, Jang-Gyoo Yang, Heeyeop Chae, Michael Barnes, Tetsuya Ishikawa +1 more | 2011-06-07 |
| 7943006 | Method and apparatus for preventing arcing at ports exposed to a plasma in plasma processing chambers | — | 2011-05-17 |
| 7910013 | Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure | Ezra Robert Gold | 2011-03-22 |
| 7901952 | Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters | Ezra Robert Gold | 2011-03-08 |
| 7883633 | Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Scott A. Hogenson | 2011-02-08 |