Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8070925 | Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target | Daniel J. Hoffman, Karl M. Brown, John Pipitone, Lara Hawrylchak | 2011-12-06 |
| 7972968 | High density plasma gapfill deposition-etch-deposition process etchant | Young S. Lee, Dmitry Lubomirsky, Daniel J. Hoffman, Jang-Gyoo Yang, Anchuan Wang | 2011-07-05 |
| 7967996 | Process for wafer backside polymer removal and wafer front side photoresist removal | Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Shahid Rauf, Ajit Balakrishna +6 more | 2011-06-28 |
| 7879183 | Apparatus and method for front side protection during backside cleaning | Imad Yousif, Nancy Fung, Martin Jeffrey Salinas, Ajit Balakrishna, Anchel Sheyner +2 more | 2011-02-01 |