Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7989366 | Dopant activation in doped semiconductor substrates | Jeffrey C. Munro, Srinivas D. Nemani, Marlon Edward Menezes, Christopher Dennis Bencher, Vijay Parihar | 2011-08-02 |
| 7972968 | High density plasma gapfill deposition-etch-deposition process etchant | Ying Rui, Dmitry Lubomirsky, Daniel J. Hoffman, Jang-Gyoo Yang, Anchuan Wang | 2011-07-05 |
| 7967913 | Remote plasma clean process with cycled high and low pressure clean steps | Zhong Qiang Hua, Sanjay Kamath, Ellie Yieh, Hien Minh Le, Anjana M. Patel +1 more | 2011-06-28 |
| 7910491 | Gapfill improvement with low etch rate dielectric liners | Young Soo Kwon, Bi Jang, Anchuan Wang, Mihaela Balseanu, Li-Qun Xia +1 more | 2011-03-22 |
| 7867921 | Reduction of etch-rate drift in HDP processes | Anchuan Wang, Manoj Vellaikal, Jason Bloking, Jin-Ho Jeon, Hemant P. Mungekar | 2011-01-11 |