Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8074677 | Method and apparatus for controlling gas flow to a processing chamber | Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2011-12-13 |
| 8048806 | Methods to avoid unstable plasma states during a process transition | Michael Kutney, Daniel J. Hoffman, Gerardo Delgadino, Ashok Sinha, Xiaoye Zhao +2 more | 2011-11-01 |
| 7975558 | Method and apparatus for gas flow measurement | Jared Ahmad Lee, Chunlei Zhang, James P. Cruse, Richard Fovell | 2011-07-12 |
| 7910013 | Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure | Daniel J. Hoffman | 2011-03-22 |
| 7901952 | Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters | Daniel J. Hoffman | 2011-03-08 |