JC

James P. Cruse

Applied Materials: 10 patents #12 of 828Top 2%
📍 Santa Cruz, CA: #4 of 223 inventorsTop 2%
🗺 California: #489 of 41,698 inventorsTop 2%
Overall (2011): #3,616 of 364,097Top 1%
10
Patents 2011

Issued Patents 2011

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
8080479 Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-12-20
8076247 Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-12-13
8074677 Method and apparatus for controlling gas flow to a processing chamber Ezra Robert Gold, Richard Fovell, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more 2011-12-13
7994872 Apparatus for multiple frequency power application Steven C. Shannon, Jang-Gyoo Yang, Matthew L. Miller, Kartik Ramaswamy 2011-08-09
7988815 Plasma reactor with reduced electrical skew using electrical bypass elements Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more 2011-08-02
7975558 Method and apparatus for gas flow measurement Jared Ahmad Lee, Ezra Robert Gold, Chunlei Zhang, Richard Fovell 2011-07-12
7968469 Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-06-28
7955646 Elimination of flow and pressure gradients in low utilization processes Andreas Hegedus, Satheesh Kuppurao 2011-06-07
7884025 Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-02-08
7879731 Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-02-01