HC

Heeyeop Chae

Applied Materials: 1 patents #339 of 828Top 45%
DC Dms Co.: 1 patents #1 of 6Top 20%
📍 Seoul, CA: #76 of 195 inventorsTop 40%
Overall (2011): #97,708 of 364,097Top 30%
2
Patents 2011

Issued Patents 2011

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
8049872 Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection method Kun Joo Park, Kwang Hoon Han, Kee Hyun Kim, Weon Mook Lee, Kyounghoon Han 2011-11-01
7955986 Capacitively coupled plasma reactor with magnetic plasma control Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Michael Barnes, Tetsuya Ishikawa +1 more 2011-06-07