Issued Patents 2004
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6815373 | Use of cyclic siloxanes for hardness improvement of low k dielectric films | Vinita Singh, Srinivas D. Nemani, Yi Zheng, Lihua Li, Tzu-Fang Huang +1 more | 2004-11-09 |
| 6806207 | Method of depositing low K films | Tzu-Fang Huang, Yung-Cheng Lu, Ellie Yieh, Wai-Fan Yau, David Cheung +5 more | 2004-10-19 |
| 6797643 | Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power | Juan Carlos Rocha-Alvarez, Maosheng Zhao, Ying Yu, Shankar Venkataraman, Srinivas D. Nemani | 2004-09-28 |
| 6790788 | Method of improving stability in low k barrier layers | Lihua Li, Tzu-Fang Huang | 2004-09-14 |
| 6784119 | Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition | Frederic Gaillard, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau, Shin-Puu Jeng +2 more | 2004-08-31 |
| 6777171 | Fluorine-containing layers for damascene structures | Ping Xu, Jia-Sheng Lee, Ishing Lou | 2004-08-17 |
| 6764958 | Method of depositing dielectric films | Srinivas D. Nemani, Dian Sugiarto, Ellie Yieh, Ping Xu, Francimar Campana-Schmitt +1 more | 2004-07-20 |
| 6759327 | Method of depositing low k barrier layers | Ping Xu, Louis Yang | 2004-07-06 |
| 6753258 | Integration scheme for dual damascene structure | Frederic Gaillard, Ellie Yieh, Paul Fisher, Margaret Gotuaco | 2004-06-22 |
| 6750141 | Silicon carbide cap layers for low dielectric constant silicon oxide layers | Paul Fisher, Margaret Gotuaco, Frederic Gaillard, Ellie Yieh | 2004-06-15 |
| 6699784 | Method for depositing a low k dielectric film (K>3.5) for hard mask application | Ping Xu, Louis Yang, Tzu-Fang Huang, Wen Zhu | 2004-03-02 |
| 6680164 | Solvent free photoresist strip and residue removal processing for post etching of low-k films | Huong Nguyen, Mark Kawaguchi, Mehul Naik, Ellie Yieh | 2004-01-20 |