Issued Patents 2004
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6794311 | Method and apparatus for treating low k dielectric layers to reduce diffusion | Kegang Huang, Judy H. Huang | 2004-09-21 |
| 6777171 | Fluorine-containing layers for damascene structures | Jia-Sheng Lee, Ishing Lou, Li-Qun Xia | 2004-08-17 |
| 6764958 | Method of depositing dielectric films | Srinivas D. Nemani, Li-Qun Xia, Dian Sugiarto, Ellie Yieh, Francimar Campana-Schmitt +1 more | 2004-07-20 |
| 6759327 | Method of depositing low k barrier layers | Li-Qun Xia, Louis Yang | 2004-07-06 |
| 6734102 | Plasma treatment for copper oxide reduction | Sudha Rathi, Judy H. Huang | 2004-05-11 |
| 6699784 | Method for depositing a low k dielectric film (K>3.5) for hard mask application | Li-Qun Xia, Louis Yang, Tzu-Fang Huang, Wen Zhu | 2004-03-02 |