Issued Patents 2004
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6806207 | Method of depositing low K films | Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more | 2004-10-19 |
| 6800571 | CVD plasma assisted low dielectric constant films | Wai-Fan Yau, Robert R. Mandal | 2004-10-05 |
| 6770556 | Method of depositing a low dielectric with organo silane | Wai-Fan Yau, Shin-Puu Jeng, Kuowei Liu, Yung-Cheng Yu | 2004-08-03 |
| 6743737 | Method of improving moisture resistance of low dielectric constant films | Wai-Fan Yau, Nasreen Chopra, Yung-Cheng Lu, Robert P. Mandal, Farhad Moghadam | 2004-06-01 |
| 6734115 | Plasma processes for depositing low dielectric constant films | Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu, Yung-Cheng Lu +5 more | 2004-05-11 |
| 6730593 | Method of depositing a low K dielectric with organo silane | Wai-Fan Yau, Shin-Puu Jeng, Kuowei Liu, Yung-Cheng Yu | 2004-05-04 |
| 6709715 | Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds | Chi-I Lang, Shin-Puu Jeng, Yeming Jim Ma, Fong Chang, Peter Wai-Man Lee | 2004-03-23 |
| 6689930 | Method and apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, William Taylor, Sebastion Raoux, Mark Fodor | 2004-02-10 |
| 6680420 | Apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, William Taylor, Sebastien Raoux, Mark Fodor | 2004-01-20 |