TI

Tetsuya Ishikawa

Applied Materials: 14 patents #5 of 884Top 1%
HI Hitachi: 2 patents #899 of 4,225Top 25%
HC Hitachi Engineering Co.: 2 patents #1 of 51Top 2%
HC Hitachi Ibaraki Business Engineering Co.: 2 patents #1 of 9Top 15%
Canon: 1 patents #1,172 of 2,554Top 50%
📍 Kasugai, CA: #1 of 1 inventorsTop 100%
Overall (2003): #341 of 273,478Top 1%
17
Patents 2003

Issued Patents 2003

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
6667527 Temperature sensor with shell Brian Lue, Liang Wang 2003-12-23
6660662 Method of reducing plasma charge damage for plasma processes Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi, Michio Aruga 2003-12-09
6660656 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-12-09
6656286 Pedestal with a thermally controlled platen Thomas Cho 2003-12-02
6639962 Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel Kunio Enomoto, Katsuhiko Hirano, Eisaku Hayashi, Ren Morinaka, Sadato Shimizu +2 more 2003-10-28
6596653 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Zhengquan Tan, Dongqing Li, Walter Zygmunt 2003-07-22
6596655 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-07-22
6589610 Deposition chamber and method for depositing low dielectric constant films Shijian Li, Yaxin Wang, Fred C. Redeker, Alan W. Collins 2003-07-08
6572708 Semiconductor wafer support lift-pin assembly Rudolf Gujer, Thomas Cho, Lily Pang, Michael P. Karazim 2003-06-03
6562690 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-05-13
6545420 Plasma reactor using inductive RF coupling, and processes Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +6 more 2003-04-08
6541282 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-04-01
6523563 Modular gas panel closet for a semiconductor wafer processing platform Thomas Cho, Robert Navasca 2003-02-25
6519991 Water jet peening apparatus Katsuhiko Hirano, Kunio Enomoto, Eisaku Hayashi, Sadato Shimizu, Ren Morinaka +2 more 2003-02-18
6517634 Chemical vapor deposition chamber lid assembly Lily Pang, Thomas Cho 2003-02-11
6518195 Plasma reactor using inductive RF coupling, and processes Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more 2003-02-11
6511153 Preliminary discharge acceptor mechanism and printing apparatus provided with the preliminary discharge acceptor mechanism 2003-01-28