Issued Patents 2003
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6666979 | Dry etch release of MEMS structures | Vidyut Gopal, Sofiane Soukane, Toi Yue Becky Leung | 2003-12-23 |
| 6653237 | High resist-selectivity etch for silicon trench etch applications | Shashank Deshmukh, David Mui, Dragan Podlesnik | 2003-11-25 |
| 6635573 | Method of detecting an endpoint during etching of a material within a recess | Wilfred Pau, Meihua Shen | 2003-10-21 |
| 6620575 | Construction of built-up structures on the surface of patterned masking used for polysilicon etch | Nam Hun Kim | 2003-09-16 |
| 6605319 | Use of integrated polygen deposition and RTP for microelectromechanical systems | Yi-Hsing Chen, Robert Z. Bachrach, John Christopher Moran | 2003-08-12 |
| 6599437 | Method of etching organic antireflection coating (ARC) layers | Oranna Yauw, Meihua Shen, Nicolas Gani | 2003-07-29 |
| 6599842 | Method for rounding corners and removing damaged outer surfaces of a trench | John Chao, Mohit Jain | 2003-07-29 |
| 6583065 | Sidewall polymer forming gas additives for etching processes | Raney Williams, Jitske Trevor, Thorsten Lill, Padmapani Nallan, Tamas Varga +1 more | 2003-06-24 |
| 6576489 | Methods of forming microstructure devices | Toi Yue Becky Leung | 2003-06-10 |
| 6551941 | Method of forming a notched silicon-containing gate structure | Chan Syun David Yang, Meihua Shen, Oranna Yauw | 2003-04-22 |
| 6541164 | Method for etching an anti-reflective coating | Ajay Kumar | 2003-04-01 |
| 6518190 | Plasma reactor with dry clean apparatus and method | Thorsten Lill | 2003-02-11 |
| 6518206 | Method for etching an anti-reflective coating | Ajay Kumar | 2003-02-11 |
| 6518192 | Two etchant etch method | Anisul Khan, Ajay Kumar, Dragan Podlesnik | 2003-02-11 |