Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660127 | Apparatus for plasma etching at a constant etch rate | Padmapani Nallan, John Holland, Valentin Todorov | 2003-12-09 |
| 6656283 | Channelled chamber surface for a semiconductor substrate processing chamber | — | 2003-12-02 |
| 6632321 | Method and apparatus for monitoring and controlling wafer fabrication process | David Mui, Michael N. Grimbergen | 2003-10-14 |
| 6613682 | Method for in situ removal of a dielectric antireflective coating during a gate etch process | Mohit Jain, Jeff Chinn | 2003-09-02 |
| 6583065 | Sidewall polymer forming gas additives for etching processes | Raney Williams, Jeffrey D. Chinn, Jitske Trevor, Padmapani Nallan, Tamas Varga +1 more | 2003-06-24 |
| 6518190 | Plasma reactor with dry clean apparatus and method | Jeffrey D. Chinn | 2003-02-11 |