Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660127 | Apparatus for plasma etching at a constant etch rate | Padmapani Nallan, Valentin Todorov, Thorsten Lill | 2003-12-09 |
| 6660659 | Plasma method and apparatus for processing a substrate | Philip Allan Kraus, Thai Cheng Chua, James P. Cruse | 2003-12-09 |
| 6635578 | Method of operating a dual chamber reactor with neutral density decoupled from ion density | Songlin Xu, Xueyu Qian | 2003-10-21 |
| 6617794 | Method for controlling etch uniformity | Michael Barnes, Valentin Todorov, Mohit Jain, Alexander Paterson | 2003-09-09 |
| 6598615 | Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber | Michael Barnes, Steve S. Y. Mak, Patrick Leahey, Jonathan D. Mohn | 2003-07-29 |
| 6507155 | Inductively coupled plasma source with controllable power deposition | Michael Barnes, Valentin Todorov | 2003-01-14 |