Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8278025 | Material for forming resist protection films and method for resist pattern formation with the same | Keita Ishiduka | 2012-10-02 |
| 8236477 | Positive resist composition and method of forming resist pattern | Tasuku Matsumiya, Daiju Shiono, Tomoyuki Hirano, Takahiro Dazai | 2012-08-07 |
| 8227169 | Compound, acid generator, resist composition, and method of forming resist pattern | Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Hideo Hada, Daisuke Kawana +2 more | 2012-07-24 |
| 8206891 | Positive resist composition and method of forming resist pattern | Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Takahiro Dazai, Tomoyuki Hirano +1 more | 2012-06-26 |
| 7951523 | Material for forming resist protective film and method for forming resist pattern using same | Keita Ishizuka, Tomovuki Hiranoa | 2011-05-31 |
| 7879529 | Material for formation of resist protection film and method of forming resist pattern therewith | Masaaki Yoshida, Keita Ishizuka | 2011-02-01 |
| 7846637 | Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film | Keita Ishizuka, Kazumasa Wakiya, Masaaki Yoshida | 2010-12-07 |
| 7799507 | Positive resist composition for immersion lithography and method for forming resist pattern | Makiko Irie, Takeshi Iwai, Yoshiyuki Utsumi, Yasuhiro Yoshii, Tsuyoshi Nakamura | 2010-09-21 |
| 7799883 | Norbornene-type polymers, compositions thereof and lithographic process using such compositions | Larry F. Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence Seger, Keita Ishiduka +1 more | 2010-09-21 |
| 7700257 | Photoresist composition and resist pattern formation method by the use thereof | Toshiyuki Ogata, Hiromitsu Tsuji, Masaaki Yoshida | 2010-04-20 |
| 7620845 | Distributed system and redundancy control method | — | 2009-11-17 |
| 7592122 | Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition | Toshiyuki Ogata, Hiromitsu Tsuji, Masaaki Yoshida, Mitsuru Sato, Syogo Matsumaru +1 more | 2009-09-22 |
| 7523113 | Distributed system, computer and state transition control method for distributed system | — | 2009-04-21 |
| 7326512 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | Toshiyuki Ogata, Hiromitsu Tsuji, Masaaki Yoshida, Hideo Hada, Ryoichi Takasu +1 more | 2008-02-05 |
| 7272632 | Distributed system and multiplexing control method for the system | — | 2007-09-18 |
| 7264918 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | Masaaki Yoshida, Taku Hirayama, Hiromitsu Tsuji, Toshiyuki Ogata, Mitsuru Sato | 2007-09-04 |
| 7171465 | Method for determining a server computer which carried out a process most recently, and high availability computer system | Koji Yamamoto | 2007-01-30 |
| 6846949 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | Toshiyuki Ogata, Hiroshi Komano | 2005-01-25 |
| 6807642 | Cluster system having virtual raid, computer for the cluster system, and parity calculation method in the cluster system | Koji Yamamoto | 2004-10-19 |
| 6799222 | Method for synchronizing program applied to distributed computer system | — | 2004-09-28 |
| 6721863 | Disk control mechanism preferable for random disk write | — | 2004-04-13 |
| 6683202 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | Toshiyuki Ogata, Hiroshi Komano | 2004-01-27 |
| 6073126 | Multi-computer system capable of abstractly and integrally describing system configuration and control contents | Shinichiro Suzuki, Katsufumi Fujimoto, Akitomo Yamada, Ryoya Mori | 2000-06-06 |
| 5978939 | Timeout monitoring system | Kenichi Mizoguchi, Shigekazu Hirokane | 1999-11-02 |