TN

Toshihisa Nozawa

TL Tokyo Electron Limited: 67 patents #27 of 5,567Top 1%
AB Asm Ip Holding B.V.: 13 patents #67 of 620Top 15%
KT Kabushiki Kaisha Toshiba: 10 patents #3,082 of 21,451Top 15%
NU National University Corporation Tohoku University: 4 patents #23 of 170Top 15%
KS Kobe Steel: 1 patents #857 of 2,031Top 45%
Overall (All Time): #21,993 of 4,157,543Top 1%
81
Patents All Time

Issued Patents All Time

Showing 51–75 of 81 patents

Patent #TitleCo-InventorsDate
8263174 Light emitting device and method for manufacturing light emitting device Yasushi Yagi, Shingo Watanabe, Chuichi Kawamura, Kimihiko Yoshino, Tadahiro Ohmi 2012-09-11
8173928 Processing device Tamaki Yuasa 2012-05-08
8158012 Film forming apparatus and method for manufacturing light emitting element Shingo Watanabe 2012-04-17
8123194 On-off valve and process apparatus employing the on-off valve 2012-02-28
8124523 Fabrication method of a semiconductor device and a semiconductor device Kohei Kawamura, Takaaki Matsuoka 2012-02-28
8110044 Substrate processing apparatus and temperature control device Koji Kotani 2012-02-07
8091863 Gate valve and semiconductor manufacturing apparatus Shinji Komoto 2012-01-10
8052887 Substrate processing apparatus Tamaki Yuasa 2011-11-08
8021975 Plasma processing method for forming a film and an electronic component manufactured by the method Kotaro Miyatani, Kohei Kawamura, Takaaki Matsuoka 2011-09-20
7940009 Plasma processing apparatus Kiyotaka Ishibashi 2011-05-10
7930992 Plasma processing equipment Kiyotaka Ishibashi 2011-04-26
7895971 Microwave plasma processing apparatus Caizhong Tian 2011-03-01
7874781 Substrate processing apparatus Takaaki Matsuoka 2011-01-25
7828927 Plasma processing device Kiyotaka Ishibashi 2010-11-09
7779783 Plasma processing device Kiyotaka Ishibashi 2010-08-24
7754995 Plasma processing apparatus and plasma processing method Masaru Sasaki, Masaji Inoue 2010-07-13
7469654 Plasma processing device Kiyotaka Ishibashi 2008-12-30
7396431 Plasma processing system for treating a substrate Lee Chen, Hiromitsu Kambara, Caizhong Tian, Tetsuya Nishizuka 2008-07-08
7268084 Method for treating a substrate Lee Chen, Hitomitsu Kambara, Caiz Hong Tian, Tetsuya Nishizuka 2007-09-11
6261428 Magnetron plasma process apparatus Keiji Horioka, Isahiro Hasegawa 2001-07-17
5888846 Method for microfabricating diamond Koichi Miyata, Koji Kobashi, Kohei Suzuki 1999-03-30
5539179 Electrostatic chuck having a multilayer structure for attracting an object Junichi Arami, Shinji Kubota, Isahiro Hasegawa, Katsuya Okumura 1996-07-23
5290381 Plasma etching apparatus Junichi Arami, Keiji Horioka, Isahiro Hasegawa 1994-03-01
5271788 Plasma processing apparatus Makoto Hasegawa, Takaya Matsushita, Keiji Horioka, Isahiro Hasegawa, Yoshio Ishikawa +2 more 1993-12-21
5255153 Electrostatic chuck and plasma apparatus equipped therewith Junichi Arami, Isahiro Hasegawa, Katsuya Okumura 1993-10-19