Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9362135 | Semiconductor device manufacturing method | Masahiko Takahashi | 2016-06-07 |
| 9048182 | Semiconductor device manufacturing method | Masahiko Takahashi | 2015-06-02 |
| 8980048 | Plasma etching apparatus | Masahiko Takahashi, Toshihisa Ozu | 2015-03-17 |
| 8969210 | Plasma etching apparatus, plasma etching method, and semiconductor device manufacturing method | Toshihisa Nozawa, Masaru Sasaki, Jun Hashimoto, Shota Yoshimura, Toshihisa Ozu | 2015-03-03 |
| 8809199 | Method of etching features in silicon nitride films | — | 2014-08-19 |
| 8765589 | Semiconductor device manufacturing method | Masahiko Takahashi | 2014-07-01 |
| 8753527 | Plasma etching method and plasma etching apparatus | Masahiko Takahashi, Toshihisa Ozu | 2014-06-17 |
| 8480848 | Plasma processing apparatus | Caizhong Tian, Toshihisa Nozawa | 2013-07-09 |
| 8343308 | Ceiling plate and plasma process apparatus | Caizhong Tian, Kiyotaka Ishibashi, Toshihisa Nozawa | 2013-01-01 |
| 8298955 | Plasma etching method | — | 2012-10-30 |
| 8267040 | Plasma processing apparatus and plasma processing method | Kiyotaka Ishibashi, Junichi Kitagawa, Singo Furui, Cai Zhong Tian, Jun Yamashita +4 more | 2012-09-18 |
| 7842617 | Etching method and etching apparatus | — | 2010-11-30 |
| 7396431 | Plasma processing system for treating a substrate | Lee Chen, Hiromitsu Kambara, Caizhong Tian, Toshihisa Nozawa | 2008-07-08 |
| 7268084 | Method for treating a substrate | Lee Chen, Hitomitsu Kambara, Caiz Hong Tian, Toshihisa Nozawa | 2007-09-11 |