Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8673725 | Multilayer sidewall spacer for seam protection of a patterned structure | Anthony Dip, Aelan Mosden, Pao-Hwa Chou, Richard A. Conti | 2014-03-18 |
| 8664102 | Dual sidewall spacer for seam protection of a patterned structure | Anthony Dip, Aelan Mosden, Pao-Hwa Chou, Richard A. Conti | 2014-03-04 |
| 8460945 | Method for monitoring status of system components | Daniel Craig Burdett, Stephen Cabral, Gert Leusink, John William Kostenko, Cory Wajda | 2013-06-11 |
| 7509962 | Method and control system for treating a hafnium-based dielectric processing system | Shingo Maku | 2009-03-31 |
| 7501352 | Method and system for forming an oxynitride layer | Masanobu Igeta, Cory Wajda, Kristen Scheer, Toshihara Eurakawa | 2009-03-10 |
| 7479454 | Method and processing system for monitoring status of system components | Daniel Craig Burdett, Stephen Cabral, Gert Leusink, John William Kostenko, Cory Wajda | 2009-01-20 |
| 7470591 | Method of forming a gate stack containing a gate dielectric layer having reduced metal content | Youngjong Lee, Cory Wajda | 2008-12-30 |
| 7235440 | Formation of ultra-thin oxide layers by self-limiting interfacial oxidation | Cory Wajda, Anthony Dip, Michael Toeller, Toshihara Furukawa, Kristen Scheer +6 more | 2007-06-26 |
| 7202186 | Method of forming uniform ultra-thin oxynitride layers | Cory Wajda, Anthony Dip, Michael Toeller, Toshihara Furukawa, Kristen Scheer +6 more | 2007-04-10 |
| 7141765 | Heat treating device | Toshiyuki Makiya, Takanori Saito, Karuki Eickmann, Sanjeev Kaushal, Anthony Dip | 2006-11-28 |
| 6974779 | Interfacial oxidation process for high-k gate dielectric process integration | Cory Wajda, Tsuyoshi Takahashi, Alessandro C. Callegari, Kristen Scheer, Sufi Zafar +1 more | 2005-12-13 |
| 6686633 | Semiconductor device, memory cell, and processes for forming them | Craig S. Lage, Mousumi Bhat, Yeong-Jyh T. Lii, Andrew G. Nagy, Larry E. Frisa +5 more | 2004-02-03 |
| 6362071 | Method for forming a semiconductor device with an opening in a dielectric layer | Bich-Yen Nguyen, William J. Taylor, Jr., Philip J. Tobin, Percy V. Gilbert, Yeong-Jyh T. Lii +1 more | 2002-03-26 |
| 6344403 | Memory device and method for manufacture | Sucharita Madhukar, Ramachandran Muralidhar, Kristen C. Smith, Bich-Yen Nguyen | 2002-02-05 |
| 6320784 | Memory cell and method for programming thereof | Ramachandran Muralidhar, Sucharita Madhukar, Bo Jiang, Bruce E. White, Srikanth B. Samavedam +1 more | 2001-11-20 |
| 6297095 | Memory device that includes passivated nanoclusters and method for manufacture | Ramachandran Muralidhar, Chitra Subramanian, Sucharita Madhukar, Bruce E. White, Michael A. Sadd +2 more | 2001-10-02 |
| 6297173 | Process for forming a semiconductor device | Philip J. Tobin, Rama I. Hegde, Hsing-Huang Tseng, Victor Wang | 2001-10-02 |
| 6184073 | Process for forming a semiconductor device having an interconnect or conductive film electrically insulated from a conductive member or region | Craig S. Lage, Mousumi Bhat, Yeong-Jyh T. Lii, Andrew G. Nagy, Larry E. Frisa +5 more | 2001-02-06 |
| 5972804 | Process for forming a semiconductor device | Philip J. Tobin, Rama I. Hegde, Hsing-Huang Tseng, Victor Wang | 1999-10-26 |
| 5013690 | Method for deposition of silicon films from azidosilane sources | Arthur Kenneth Hochberg, David A. Roberts | 1991-05-07 |
| 4992299 | Deposition of silicon nitride films from azidosilane sources | Arthur Kenneth Hochberg, David A. Roberts | 1991-02-12 |
| 4992306 | Deposition of silicon dioxide and silicon oxynitride films using azidosilane sources | Arthur Kenneth Hochberg, David A. Roberts | 1991-02-12 |
| 4981724 | Deposition of silicon oxide films using alkylsilane liquid sources | Arthur Kenneth Hochberg | 1991-01-01 |