Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10861698 | Pattern fidelity enhancement | Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Yung-Sung Yen, Wei-Hao Wu +3 more | 2020-12-08 |
| 10761427 | Photoresist and method of formation and use | Keng-Chu Lin, Joung-Wei Liou, Cheng-Han Wu | 2020-09-01 |
| 10707081 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2020-07-07 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2020-05-19 |
| 10354874 | Directional processing to remove a layer or a material formed over a substrate | Shih-Chun Huang, Chin-Hsiang Lin, Chien-Wen Lai, Ru-Gun Liu, Wei-Liang Lin +3 more | 2019-07-16 |
| 9983473 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Kuei-Liang Lu +2 more | 2018-05-29 |
| 9925293 | Solution for treating contact lens | Han-Yi Chang, Ya-Hsuan Liao, Shu Lu, Yu-Chin Lai | 2018-03-27 |
| 9823574 | Lithography alignment marks | Ching-Huang Chen, Hung-Chang Hsieh, Kuei-Liang Lu, Spencer B. T. Lin | 2017-11-21 |
| 9805154 | Method of lithography process with inserting scattering bars | Irene Ho, Ai-Jen Hung, Hung-Chang Hsieh, Kuei-Liang Lu | 2017-10-31 |
| 9786569 | Overlay measurement and compensation in semiconductor fabrication | Wei-De Ho, Shu-Hong Lin, Chih-Jung Chiang, Chang-Yi Tsai, Tsung-Lin Yang +1 more | 2017-10-10 |
| 9766545 | Methods for small trench patterning using chemical amplified photoresist compositions | Chia-Chu Liu | 2017-09-19 |
| 9703918 | Two-dimensional process window improvement | Wei-De Ho, Chi-Yuan Sun, Hung-Chang Hsieh | 2017-07-11 |
| 9612526 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Kuei-Liang Lu +2 more | 2017-04-04 |
| 9524939 | Multiple edge enabled patterning | Ming-Feng Shieh, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin | 2016-12-20 |
| 9478459 | Device and methods for small trench patterning | — | 2016-10-25 |
| 9341945 | Photoresist and method of formation and use | Keng-Chu Lin, Joung-Wei Liou, Cheng-Han Wu | 2016-05-17 |
| 9287125 | Multiple edge enabled patterning | Ming-Feng Shieh, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin | 2016-03-15 |
| 9196491 | End-cut first approach for critical dimension control | Li-Te Lin, Meng-Jun Wang, Hui Ouyang | 2015-11-24 |
| 9111864 | Device and methods for small trench patterning | — | 2015-08-18 |
| 9093276 | Methods for small trench patterning using chemical amplified photoresist compositions | Chia-Chu Liu | 2015-07-28 |
| 8877598 | Method of lithography process with an under isolation material layer | Chung-Ming Wang, Yu-Lun Liu, Chia-Chu Liu, Kuei-Shun Chen | 2014-11-04 |
| 8865595 | Device and methods for forming partially self-aligned trenches | — | 2014-10-21 |
| 8767302 | Laminated optical disk | Jong-Woei Whang, Chieh-Jen Hsiao, Meng-Che Tsai, Chung-Wei Wang | 2014-07-01 |
| 8765608 | Methods for forming trenches | — | 2014-07-01 |
| 8730473 | Multiple edge enabled patterning | Ming-Feng Shieh, Ru-Gun Liu, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin | 2014-05-20 |