Issued Patents All Time
Showing 26–50 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11435660 | Photomask and method of fabricating a photomask | Hsin-Chang Lee, Ping-Hsun Lin, Yen-Cheng HO, Chih-Cheng Lin | 2022-09-06 |
| 11430671 | Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors | Chen-Yang Lin, Chung-Hsuan Liu, Ku-Hsiang Sung, Kuan-Wen Lin, Hsin-Chang Lee | 2022-08-30 |
| 11422466 | Photomask including fiducial mark and method of making semiconductor device using the photomask | Hsin-Chang Lee, Ping-Hsun Lin, Chih-Cheng Lin | 2022-08-23 |
| 11349014 | Air spacer and method of forming same | Ming-Jhe Sie, Chen-Huang Huang, Shao-Hua Hsu, Cheng-Chung Chang, Szu-Ping Lee +2 more | 2022-05-31 |
| 11327405 | Method of manufacturing photo masks | Chien-Cheng Chen, Hsin-Chang Lee, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2022-05-10 |
| 11294292 | Particle removing assembly and method of cleaning mask for lithography | Chen-Yang Lin, Da-Wei Yu, Li-Hsin Wang, Kuan-Wen Lin, Hsin-Chang Lee | 2022-04-05 |
| 11143954 | Mask patterns and method of manufacture | Wen-Chang Hsueh, Ta-Cheng Lien, Hsin-Chang Lee | 2021-10-12 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2021-10-05 |
| 11042084 | Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask | Hsin-Chang Lee, Chih-Cheng Lin, Ping-Hsun Lin | 2021-06-22 |
| 11029593 | Lithography mask with a black border regions and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2021-06-08 |
| 10996553 | Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same | Wen-Chang Hsueh, Huan-Ling Lee, Hsin-Chang Lee | 2021-05-04 |
| 10867998 | Semiconductor structure cutting process and structures formed thereby | Chih-Chang Hung, Ming-Ching Chang, Shu-Yuan Ku, Yi-Hsuan Hsiao, I-Wei Yang | 2020-12-15 |
| 10866504 | Lithography mask with a black border region and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2020-12-15 |
| 10833077 | Semiconductor structure cutting process and structures formed thereby | Chih-Chang Hung, Ming-Ching Chang, Shu-Yuan Ku, Yi-Hsuan Hsiao, I-Wei Yang | 2020-11-10 |
| 10816892 | Method of manufacturing photo masks | Chien-Cheng Chen, Hsin-Chang Lee, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2020-10-27 |
| 10514597 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2019-12-24 |
| 10295899 | Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask | Hsin-Chang Lee, Chih-Cheng Lin, Ping-Hsun Lin | 2019-05-21 |
| 9995999 | Lithography mask | Yun-Yue Lin, Hsin-Chang Lee, Anthony Yen | 2018-06-12 |
| 9869928 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chih-Tsung Shih, Hsin-Chang Lee, Anthony Yen | 2018-01-16 |
| 9664999 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2017-05-30 |
| 9651857 | Mask and method for forming the same | Yun-Yue Lin, Hsin-Chang Lee, Ta-Cheng Lien, Anthony Yen | 2017-05-16 |
| 9557649 | Assist feature for a photolithographic process | Tao Huang, Hsin-Chang Lee, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2017-01-31 |
| 9558944 | System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle | Chia-Hao Hsu, Chia-Chen Chen, Jui-Ching Wu, Shang-Chieh Chien, Chia-Ching Huang | 2017-01-31 |
| 9530200 | Method and system for inspection of a patterned structure | Wen-Chang Hsueh, Hsin-Chang Lee | 2016-12-27 |
| 9442368 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-09-13 |