Issued Patents All Time
Showing 76–100 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7625676 | Photomask blank, photomask and fabrication method thereof | Hiroki Yoshikawa, Yoshinori Kinase, Satoshi Okazaki, Takashi Haraguchi, Masahide Iwakata +1 more | 2009-12-01 |
| 7622227 | Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof | Hiroki Yoshikawa, Tamotsu Maruyama, Satoshi Okazaki | 2009-11-24 |
| 7618753 | Photomask blank, photomask and method for producing those | Hiroki Yoshikawa, Yoshinori Kinase, Satoshi Okazaki, Takashi Haraguchi, Masahide Iwakata +3 more | 2009-11-17 |
| 7598004 | Film-depositing target and preparation of phase shift mask blank | Hiroki Yoshikawa, Toshinobu Ishihara, Satoshi Okazaki, Tadashi Saga, Kimihiro Okada +3 more | 2009-10-06 |
| 7556892 | Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method | Kimihiro Okada, Masahide Iwakata, Takashi Haraguchi, Mikio Takagi, Yuichi Fukushima +4 more | 2009-07-07 |
| 7419749 | Halftone phase shift mask blank, halftone phase shift mask and their preparation | Hiroki Yoshikawa, Satoshi Okazaki | 2008-09-02 |
| 7351505 | Phase shift mask blank, phase shift mask, and pattern transfer method | Hiroki Yoshikawa, Satoshi Okazaki, Takashi Haraguchi, Yuichi Fukushima, Yoshihiro Ii +1 more | 2008-04-01 |
| 7344806 | Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask | Hiroki Yoshikawa, Noriyasu Fukushima, Hideo Kaneko, Satoshi Okazaki | 2008-03-18 |
| 7329474 | Photomask blank, photomask, and method of manufacture | Hiroki Yoshikawa, Noriyasu Fukushima, Hideo Kaneko, Satoshi Okazaki | 2008-02-12 |
| 7195846 | Methods of manufacturing photomask blank and photomask | Hideo Kaneko, Tetsushi Tsukamoto, Masayuki Mogi, Katsuya Okumura | 2007-03-27 |
| 7179567 | Phase shift mask blank, phase shift mask, and method of manufacture | Masayuki Nakatsu, Tsuneo Numanami, Atsushi Tajika, Hideo Kaneko, Satoshi Okazaki | 2007-02-20 |
| 7037625 | Phase shift mask blank and method of manufacture | Hideo Kaneko, Tetsushi Tsukamoto, Satoshi Okazaki | 2006-05-02 |
| 6733930 | Photomask blank, photomask and method of manufacture | Tsutomu Shinagawa, Tamotsu Maruyama, Hideo Kaneko, Mikio Kojima, Satoshi Okazaki | 2004-05-11 |
| 6727027 | Photomask blank and photomask | Tetsushi Tsukamoto, Hideo Kaneko, Tamotsu Maruyama, Tsutomu Shinagawa, Satoshi Okazaki | 2004-04-27 |
| 6641958 | Phase shift mask blank, phase shift mask, and methods of manufacture | Tamotsu Maruyama, Mikio Kojima, Hideo Kaneko, Masataka Watanabe, Satoshi Okazaki | 2003-11-04 |
| 6589699 | Photomask blank and photomask | Hideo Kaneko, Satoshi Okazaki | 2003-07-08 |
| 6514642 | Phase shift mask and method of manufacture | Satoshi Okazaki, Tamotsu Maruyama, Hideo Kaneko, Shinichi Kohno | 2003-02-04 |
| 6503669 | Photomask blank, photomask and method of manufacture | Hideo Kaneko, Tamotsu Maruyama, Satoshi Okazaki | 2003-01-07 |
| 6503668 | Phase shift mask blank, phase shift mask, and method of manufacture | Hideo Kaneko, Tamotsu Maruyama, Satoshi Okazaki | 2003-01-07 |
| 6362076 | Method of fabricating an SOI wafer by hydrogen ion delamination without independent bonding heat treatment | Hiroji Aga, Norihiro Kobayashi, Kiyoshi Mitani | 2002-03-26 |
| 6352801 | Phase shift mask and making process | Satoshi Okazaki, Hideo Kaneko, Tamotsu Maruyama | 2002-03-05 |
| 6140210 | Method of fabricating an SOI wafer and SOI wafer fabricated thereby | Hiroji Aga, Kiyoshi Mitani | 2000-10-31 |
| 5180554 | Method of detecting the presence of moisture in a gas | Toru Yamaguchi, Hideo Nakazawa | 1993-01-19 |
| 5007243 | Vessel for making high-purity fine particles of active metals | Toru Yamaguchi, Hideo Nakazawa | 1991-04-16 |
| 4971258 | Method of making high-purity fine particles of reactive metals and manufacturing vessel therefor | Toru Yamaguchi, Hideo Nakazawa | 1990-11-20 |