Issued Patents All Time
Showing 26–50 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10466582 | Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus | — | 2019-11-05 |
| 10466583 | Halftone phase shift mask blank and halftone phase shift mask | Takuro Kosaka, Kouhei Sasamoto, Hideo Kaneko | 2019-11-05 |
| 10459333 | Halftone phase shift photomask blank and making method | Takuro Kosaka, Hideo Kaneko | 2019-10-29 |
| 10372030 | Halftone phase shift mask blank and halftone phase shift mask | Kouhei Sasamoto, Takuro Kosaka, Hideo Kaneko | 2019-08-06 |
| 10146122 | Halftone phase shift photomask blank and making method | Takuro Kosaka, Hideo Kaneko | 2018-12-04 |
| 10120274 | Method of manufacturing photomask blank and photomask blank | Souichi Fukaya | 2018-11-06 |
| 10078260 | Phase shift mask blank, phase shift mask, and blank preparing method | Takuro Kosaka | 2018-09-18 |
| 9927695 | Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method | Takuro Kosaka | 2018-03-27 |
| 9880459 | Photomask blank and method for preparing photomask | Kouhei Sasamoto, Souichi Fukaya | 2018-01-30 |
| 9864266 | Photomask blank | Kouhei Sasamoto | 2018-01-09 |
| 9812300 | Silicon target for sputtering film formation and method for forming silicon-containing thin film | Hiroki Yoshikawa, Hideo Kaneko | 2017-11-07 |
| 9798229 | Designing of photomask blank and photomask blank | Kouhei Sasamoto, Hideo Kaneko, Souichi Fukaya | 2017-10-24 |
| 9778559 | Method for preparing halftone phase shift photomask blank | Takuro Kosaka | 2017-10-03 |
| 9709885 | Photomask blank and method for manufacturing photomask blank | Takashi Yoshii, Toyohisa Sakurada, Akira Ikeda, Hideo Kaneko, Satoshi Watanabe +1 more | 2017-07-18 |
| 9689066 | Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method | Hiroki Yoshikawa, Souichi Fukaya, Hideo Nakagawa | 2017-06-27 |
| 9651858 | Binary photomask blank, preparation thereof, and preparation of binary photomask | Takuro Kosaka, Kazuhiro Nishikawa | 2017-05-16 |
| 9645485 | Halftone phase shift photomask blank and making method | Takuro Kosaka, Hideo Kaneko, Toyohisa Sakurada | 2017-05-09 |
| 9618838 | Photomask blank | Souichi Fukaya | 2017-04-11 |
| 9581892 | Method of manufacturing photomask blank and photomask blank | Souichi Fukaya | 2017-02-28 |
| 9541823 | Photomask blank | Kouhei Sasamoto, Souichi Fukaya, Hideo Nakagawa, Hideo Kaneko | 2017-01-10 |
| 9488907 | Photomask blank, process for production of photomask, and chromium-containing material film | Hiroki Yoshikawa, Souichi Fukaya, Tsuneo Yamamoto, Hideo Nakagawa | 2016-11-08 |
| 9488906 | Photomask blank and method for manufacturing photomask blank | Takashi Yoshii, Toyohisa Sakurada, Akira Ikeda, Hideo Kaneko, Satoshi Watanabe +1 more | 2016-11-08 |
| 9400422 | Method for manufacturing photomask blank | Takashi Yoshii, Yoshio Kawai, Satoshi Watanabe, Akira Ikeda, Toyohisa Sakurada +1 more | 2016-07-26 |
| 9366951 | Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method | Toyohisa Sakurada, Hideo Kaneko, Takuro Kosaka, Kouhei Sasamoto | 2016-06-14 |
| 9164374 | Photomask making method, photomask blank and dry etching method | Shinichi Igarashi, Hideo Kaneko, Kazuhiro Nishikawa | 2015-10-20 |