Issued Patents All Time
Showing 26–50 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211252 | Systems and methods for copper (I) suppression in electrochemical deposition | John L. Klocke, You Wang | 2021-12-28 |
| 11179508 | Dialysis machine tubing protection | David Yuds, Maria Tamayo-Coffey, Jonathan Leclerc, Jessica Steuber | 2021-11-23 |
| 10971354 | Drying high aspect ratio features | John L. Klocke, Paul R. McHugh, Stuart Crane, Richard W. Plavidal | 2021-04-06 |
| 10840104 | Controlled etch of nitride features | John L. Klocke, Charles Sharbono, Kyle M. Hanson, Paul R. McHugh | 2020-11-17 |
| 10546762 | Drying high aspect ratio features | John L. Klocke, Paul R. McHugh, Stuart Crane, Richard W. Plavidal | 2020-01-28 |
| 10354875 | Techniques for improved removal of sacrificial mask | Rajesh Prasad, Ning Zhan, Tzu-Yu Liu, James Cournoyer, Kyu-Ha Shim +4 more | 2019-07-16 |
| 10240248 | Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control | Paul Van Valkenburg, Robert Mikkola, John L. Klocke, Paul R. McHugh, Gregory J. Wilson +1 more | 2019-03-26 |
| 10191379 | Removing photoresist from a wafer | Paul R. McHugh, Kyle M. Hanson, John L. Klocke, Stuart Crane, Gregory J. Wilson | 2019-01-29 |
| 10002771 | Methods for chemical mechanical polishing (CMP) processing with ozone | Prayudi Lianto, Kuma Hsiung, John L. Klocke, Mohamed Rafi, MUHAMMAD AZIM +2 more | 2018-06-19 |
| 8028978 | Wafer handling system | Gordon Nelson, Jeffry Davis, Raymon F. Thompson | 2011-10-04 |
| 7416611 | Process and apparatus for treating a workpiece with gases | — | 2008-08-26 |
| 7404863 | Methods of thinning a silicon wafer using HF and ozone | — | 2008-07-29 |
| 7378355 | System and methods for polishing a wafer | Thomas Gebhart | 2008-05-27 |
| 7279431 | Vapor phase etching MEMS devices | — | 2007-10-09 |
| 7264680 | Process and apparatus for treating a workpiece using ozone | Thomas Gebhart | 2007-09-04 |
| 7163588 | Processing a workpiece using water, a base, and ozone | — | 2007-01-16 |
| 7005010 | Multi-process system | Dana Scranton, Erik Lund, Worm Lund | 2006-02-28 |
| 6869486 | Methods for removing metallic contamination from wafer containers | Ronald Breese, C. Bryer, Dana Scranton | 2005-03-22 |
| 6869487 | Process and apparatus for treating a workpiece such as a semiconductor wafer | — | 2005-03-22 |
| 6843857 | Methods for cleaning semiconductor surfaces | — | 2005-01-18 |
| 6837252 | Apparatus for treating a workpiece with steam and ozone | — | 2005-01-04 |
| 6830628 | Methods for cleaning semiconductor surfaces | — | 2004-12-14 |
| 6817370 | Method for processing the surface of a workpiece | Mignon P. Hess | 2004-11-16 |
| 6745494 | Method and apparatus for processing wafers under pressure | Ian Sharp, Craig P. Meuchel, H. Frederick Woods | 2004-06-08 |
| 6746565 | Semiconductor processor with wafer face protection | Martin Bleck, Timothy J. Reardon | 2004-06-08 |